Mark J. Wihl

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Monitoring changes in photomask defectivity
- Patent number 9,892,503
- Issue date Feb 13, 2018
- KLA-Tencor Corporation
- Chun Guan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Monitoring changes in photomask defectivity
- Patent number 9,518,935
- Issue date Dec 13, 2016
- KLA-Tencor Corporation
- Chun Guan
- G01 - MEASURING TESTING
Information Patent Grant
Method for detecting lithographically significant defects on reticles
- Patent number 7,873,204
- Issue date Jan 18, 2011
- KLA-Tencor Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for detecting and classifying defects on a reticle
- Patent number 7,738,093
- Issue date Jun 15, 2010
- KLA-Tencor Corp.
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple design database layer inspection
- Patent number 7,027,635
- Issue date Apr 11, 2006
- KLA-Tencor Technologies Corporation
- Mark J. Wihl
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Efficient phase defect detection system and method
- Patent number 6,674,522
- Issue date Jan 6, 2004
- KLA-Tencor Technologies Corporation
- Matthias C. Krantz
- G01 - MEASURING TESTING
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,584,218
- Issue date Jun 24, 2003
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G01 - MEASURING TESTING
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,363,166
- Issue date Mar 26, 2002
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,052,478
- Issue date Apr 18, 2000
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,737,072
- Issue date Apr 7, 1998
- KLA Instruments Corporation
- David Garth Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 5,572,598
- Issue date Nov 5, 1996
- KLA Instruments Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,563,702
- Issue date Oct 8, 1996
- KLA Instruments Corporation
- David G. Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automatic high speed optical inspection system
- Patent number 5,085,517
- Issue date Feb 4, 1992
- Curt H. Chadwick
- G01 - MEASURING TESTING
Information Patent Grant
Reticle inspection system
- Patent number 4,926,489
- Issue date May 15, 1990
- KLA Instruments Corporation
- Donald L. Danielson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automatic photomask inspection system having image enhancement means
- Patent number 4,633,504
- Issue date Dec 30, 1986
- KLA Instruments Corporation
- Mark J. Wihl
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask inspection apparatus and method with improved defect dete...
- Patent number 4,579,455
- Issue date Apr 1, 1986
- KLA Instruments Corporation
- Kenneth Levy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Automatic system and method for inspecting hole quality
- Patent number 4,555,798
- Issue date Nov 26, 1985
- KLA Instruments Corporation
- William H. Broadbent
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask inspection apparatus and method using corner comparator d...
- Patent number 4,532,650
- Issue date Jul 30, 1985
- KLA Instruments Corporation
- Tim S. Wihl
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MONITORING CHANGES IN PHOTOMASK DEFECTIVITY
- Publication number 20170053395
- Publication date Feb 23, 2017
- KLA-Tencor Corporation
- Chun Guan
- G01 - MEASURING TESTING
Information Patent Application
MONITORING CHANGES IN PHOTOMASK DEFECTIVITY
- Publication number 20150029498
- Publication date Jan 29, 2015
- KLA-Tencor Corporation
- Chun Guan
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE
- Publication number 20080304056
- Publication date Dec 11, 2008
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES
- Publication number 20080170773
- Publication date Jul 17, 2008
- KLA-Tencor Technologies Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Efficient phase defect detection system and method
- Publication number 20020171825
- Publication date Nov 21, 2002
- KLA-TENCOR TECHNOLOGIES, INC.
- Matthias C. Krantz
- G01 - MEASURING TESTING
Information Patent Application
Automated photomask inspection apparatus
- Publication number 20020054702
- Publication date May 9, 2002
- Mark Joseph Wihl
- G01 - MEASURING TESTING

Mark J. Wihl

Person

Patents Grantslast 30 patents

Monitoring changes in photomask defectivity

Monitoring changes in photomask defectivity

Method for detecting lithographically significant defects on reticles

Methods for detecting and classifying defects on a reticle

Multiple design database layer inspection

Efficient phase defect detection system and method

Automated photomask inspection apparatus

Automated photomask inspection apparatus

Automated photomask inspection apparatus

Automated photomask inspection apparatus and method

Automated photomask inspection apparatus

Automated photomask inspection apparatus and method

Automatic high speed optical inspection system

Reticle inspection system

Automatic photomask inspection system having image enhancement means

Photomask inspection apparatus and method with improved defect dete...

Automatic system and method for inspecting hole quality

Photomask inspection apparatus and method using corner comparator d...

Patents Applicationslast 30 patents

MONITORING CHANGES IN PHOTOMASK DEFECTIVITY

MONITORING CHANGES IN PHOTOMASK DEFECTIVITY

METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE

METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES

Efficient phase defect detection system and method

Automated photomask inspection apparatus