Mark Josef SCHUSTER

Person

Fairfield, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus
- Patent number 10,788,763
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Jan Steven Christiaan Westerlaken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas flow optimization in reticle stage environment
- Patent number 10,031,428
- Issue date Jul 24, 2018
- ASML Netherlands B.V.
- Koen Cuypers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support, lithographic apparatus, and method of co...
- Patent number 9,977,351
- Issue date May 22, 2018
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device manipulating system and lithographic apparatuses
- Patent number 9,910,368
- Issue date Mar 6, 2018
- ASML Netherlands B.V.
- Christiaan Louis Valentin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support, lithographic apparatus, and method of co...
- Patent number 9,766,557
- Issue date Sep 19, 2017
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support and lithographic apparatus
- Patent number 9,740,112
- Issue date Aug 22, 2017
- ASML Holding N.V.
- Arindam Sinharoy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle cooling system in a lithographic apparatus
- Patent number 9,632,434
- Issue date Apr 25, 2017
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Real-time reticle curvature sensing
- Patent number 9,632,429
- Issue date Apr 25, 2017
- ASML Holding N.V.
- Christopher Charles Ward
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support, lithographic apparatus, and method of co...
- Patent number 9,632,433
- Issue date Apr 25, 2017
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 9,513,568
- Issue date Dec 6, 2016
- ASML Netherlands B.V.
- Jan Steven Christiaan Westerlaken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining position and curvature information directly from a surf...
- Patent number 9,377,700
- Issue date Jun 28, 2016
- ASML Holding N.V.
- Mark Josef Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Patterning Device Support, Lithographic Apparatus, And Method Of Co...
- Publication number 20170307986
- Publication date Oct 26, 2017
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Support, Lithographic Apparatus, And Method Of Co...
- Publication number 20170160652
- Publication date Jun 8, 2017
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20170068175
- Publication date Mar 9, 2017
- ASML NETHERLANDS B.V.
- Jan Steven Christiaan Westerlaken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas Flow Optimization in Reticle Stage Environment
- Publication number 20150355557
- Publication date Dec 10, 2015
- ASML NETHERLANDS B.V.
- Koen CUYPERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Support, Lithographic Apparatus, And Method Of Co...
- Publication number 20150301456
- Publication date Oct 22, 2015
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Support and Lithographic Apparatus
- Publication number 20150277240
- Publication date Oct 1, 2015
- ASML Holding N.V.
- Arindam Sinharoy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Manipulating System and Lithographic Apparatuses
- Publication number 20150277241
- Publication date Oct 1, 2015
- ASML NETHERLANDS B.V.
- Christiaan Louis Valentin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Cooling System In A Lithographic Apparatus
- Publication number 20150241796
- Publication date Aug 27, 2015
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Real-Time Reticle Curvature Sensing
- Publication number 20150220005
- Publication date Aug 6, 2015
- ASML Holding N.V.
- Christopher Charles Ward
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20150168854
- Publication date Jun 18, 2015
- ASML NETHERLANDS B.V.
- Jan Steven Christiaan Westerlaken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURF...
- Publication number 20140307246
- Publication date Oct 16, 2014
- ASML Holding N.V.
- Mark Josef Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mark Josef SCHUSTER

Person

Patents Grantslast 30 patents

Lithographic apparatus

Gas flow optimization in reticle stage environment

Patterning device support, lithographic apparatus, and method of co...

Patterning device manipulating system and lithographic apparatuses

Patterning device support, lithographic apparatus, and method of co...

Patterning device support and lithographic apparatus

Reticle cooling system in a lithographic apparatus

Real-time reticle curvature sensing

Patterning device support, lithographic apparatus, and method of co...

Lithographic apparatus

Determining position and curvature information directly from a surf...

Patents Applicationslast 30 patents

Patterning Device Support, Lithographic Apparatus, And Method Of Co...

Patterning Device Support, Lithographic Apparatus, And Method Of Co...

LITHOGRAPHIC APPARATUS

Gas Flow Optimization in Reticle Stage Environment

Patterning Device Support, Lithographic Apparatus, And Method Of Co...

Patterning Device Support and Lithographic Apparatus

Patterning Device Manipulating System and Lithographic Apparatuses

Reticle Cooling System In A Lithographic Apparatus

Real-Time Reticle Curvature Sensing

LITHOGRAPHIC APPARATUS

DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURF...