Mark Naoshi Kawaguchi

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Film stack simplification for high aspect ratio patterning and vert...
- Patent number 12,080,592
- Issue date Sep 3, 2024
- Lam Research Corporation
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Efficient cleaning and etching of high aspect ratio structures
- Patent number 12,040,193
- Issue date Jul 16, 2024
- Lam Research Corporation
- Ji Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 11,967,486
- Issue date Apr 23, 2024
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Efficient cleaning and etching of high aspect ratio structures
- Patent number 11,488,831
- Issue date Nov 1, 2022
- Lam Research Corporation
- Ji Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrahigh selective nitride etch to form FinFET devices
- Patent number 11,469,079
- Issue date Oct 11, 2022
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ vapor deposition polymerization to form polymers as precurs...
- Patent number 11,065,654
- Issue date Jul 20, 2021
- Lam Research Corporation
- Mark Kawaguchi
- B08 - CLEANING
Information Patent Grant
Metal doped carbon based hard mask removal in semiconductor fabrica...
- Patent number 11,062,897
- Issue date Jul 13, 2021
- Lam Research Corporation
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma apparatus for high aspect ratio selective lateral etch using...
- Patent number 11,011,388
- Issue date May 18, 2021
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio selective lateral etch using cyclic passivation a...
- Patent number 10,276,398
- Issue date Apr 30, 2019
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated apparatus for efficient removal of halogen residues from...
- Patent number 9,735,002
- Issue date Aug 15, 2017
- Applied Materials, Inc.
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of particle contaminant removal
- Patent number 9,159,593
- Issue date Oct 13, 2015
- Lam Research Corporation
- Mark Naoshi Kawaguchi
- B08 - CLEANING
Information Patent Grant
Method for substrate cleaning including movement of substrate below...
- Patent number 8,900,374
- Issue date Dec 2, 2014
- Lam Research Corporation
- Cheng-Yu (Sean) Lin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of particle contaminant removal
- Patent number 8,828,145
- Issue date Sep 9, 2014
- Lam Research Corporation
- Yizhak Sabba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-stage substrate cleaning method and apparatus
- Patent number 8,757,177
- Issue date Jun 24, 2014
- Lam Research Corporation
- Arnold Kholodenko
- B08 - CLEANING
Information Patent Grant
Multi-stage substrate cleaning method and apparatus
- Patent number 8,317,934
- Issue date Nov 27, 2012
- Lam Research Corporation
- Arnold Kholodenko
- B08 - CLEANING
Information Patent Grant
System and method for monitoring wafer stress
- Patent number 8,293,023
- Issue date Oct 23, 2012
- Lam Research Corporation
- John Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling corrosion of a substrate
- Patent number 8,101,025
- Issue date Jan 24, 2012
- Applied Materials, Inc.
- Eu Jin Lim
- B08 - CLEANING
Information Patent Grant
Apparatus and system for cleaning substrate
- Patent number 7,849,554
- Issue date Dec 14, 2010
- Lam Research Corporation
- Cheng-Yu (Sean) Lin
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for removing a halogen-containing residue
- Patent number 7,846,347
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Mark N. Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated method and apparatus for efficient removal of halogen re...
- Patent number 7,655,571
- Issue date Feb 2, 2010
- Applied Materials, Inc.
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for performing hydrogen optical emission endpo...
- Patent number 7,648,916
- Issue date Jan 19, 2010
- Applied Materials, Inc.
- Elizabeth G. Pavel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning of native oxide with hydrogen-containing radicals
- Patent number 7,604,708
- Issue date Oct 20, 2009
- Applied Materials, Inc.
- Bingxi Sun Wood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for removing a halogen-containing residue
- Patent number 7,374,696
- Issue date May 20, 2008
- Applied Materials, Inc.
- Mark N. Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of photoresist removal in the presence of a dielectric layer...
- Patent number 6,991,739
- Issue date Jan 31, 2006
- Applied Materials, Inc.
- Mark N. Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus and method
- Patent number 6,692,903
- Issue date Feb 17, 2004
- Applied Materials, Inc.
- Haojiang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solvent free photoresist strip and residue removal processing for p...
- Patent number 6,680,164
- Issue date Jan 20, 2004
- Applied Materials Inc.
- Huong Thanh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20240387258
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES
- Publication number 20240363355
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Ji ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20240266147
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTIMIZING EDGE RADICAL FLUX IN A DOWNSTREAM PLASMA CHAMBER
- Publication number 20230298859
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SILICON TRIM BY THERMAL ETCHING
- Publication number 20230268189
- Publication date Aug 24, 2023
- LAM RESEARCH CORPORATION
- Nathan Musselwhite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS
- Publication number 20230207328
- Publication date Jun 29, 2023
- LAM RESEARCH CORPORATION
- Nathan MUSSELWHITE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RAPID AND PRECISE TEMPERATURE CONTROL FOR THERMAL ETCHING
- Publication number 20230131233
- Publication date Apr 27, 2023
- LAM RESEARCH CORPORATION
- Nathan Lavdovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES
- Publication number 20230084901
- Publication date Mar 16, 2023
- LAM RESEARCH CORPORATION
- Kwame EASON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES
- Publication number 20230035732
- Publication date Feb 2, 2023
- LAM RESEARCH CORPORATION
- Ji ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR CLEANING OF SUBSTRATE SURFACES
- Publication number 20220356585
- Publication date Nov 10, 2022
- LAM RESEARCH CORPORATION
- David MUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20220076924
- Publication date Mar 10, 2022
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20220051938
- Publication date Feb 17, 2022
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES
- Publication number 20210249274
- Publication date Aug 12, 2021
- LAM RESEARCH CORPORATION
- Ji ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...
- Publication number 20190206697
- Publication date Jul 4, 2019
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PLASMA-LESS DE-HALOGENATION
- Publication number 20190051540
- Publication date Feb 14, 2019
- LAM RESEARCH CORPORATION
- Ji Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...
- Publication number 20190043732
- Publication date Feb 7, 2019
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURS...
- Publication number 20190015878
- Publication date Jan 17, 2019
- LAM RESEARCH CORPORATION
- Mark KAWAGUCHI
- B08 - CLEANING
Information Patent Application
METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...
- Publication number 20180358220
- Publication date Dec 13, 2018
- LAM RESEARCH CORPORATION
- Yongsik Yu
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES
- Publication number 20180269070
- Publication date Sep 20, 2018
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR MONITORING WAFER STRESS
- Publication number 20140083463
- Publication date Mar 27, 2014
- John Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STAGE SUBSTRATE CLEANING METHOD AND APPARATUS
- Publication number 20130068261
- Publication date Mar 21, 2013
- Arnold Kholodenko
- B08 - CLEANING
Information Patent Application
SYSTEM AND METHOD FOR MONITORING WAFER STRESS
- Publication number 20110094538
- Publication date Apr 28, 2011
- John Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and System for Cleaning Substrate
- Publication number 20110048467
- Publication date Mar 3, 2011
- LAM RESEARCH CORPORATION
- Cheng-Yu (Sean) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PARTICLE CONTAMINANT REMOVAL
- Publication number 20100313917
- Publication date Dec 16, 2010
- Lam Research Corp.
- Mark Naoshi Kawaguchi
- B08 - CLEANING
Information Patent Application
Multi-Stage Substrate Cleaning Method and Apparatus
- Publication number 20100288311
- Publication date Nov 18, 2010
- LAM RESEARCH CORPORATION
- Arnold Kholodenko
- B08 - CLEANING
Information Patent Application
APPARATUS AND SYSTEM FOR CLEANING SUBSTRATE
- Publication number 20100269285
- Publication date Oct 28, 2010
- Lam Research Corporation
- Cheng-Yu (Sean) Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR USING A VISCOELASTIC CLEANING MATERIAL TO...
- Publication number 20100258142
- Publication date Oct 14, 2010
- Mark Naoshi Kawaguchi
- B08 - CLEANING
Information Patent Application
Method of Particle Contaminant Removal
- Publication number 20100229890
- Publication date Sep 16, 2010
- Lam Research Corp.
- Yizhak T. Sabba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR TUNABLE ISOTROPIC RECESS ETCHING OF SILICO...
- Publication number 20090032880
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM...
- Publication number 20090014324
- Publication date Jan 15, 2009
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS

Mark Naoshi Kawaguchi

Person

Patents Grantslast 30 patents

Film stack simplification for high aspect ratio patterning and vert...

Efficient cleaning and etching of high aspect ratio structures

Substrate processing system including dual ion filter for downstrea...

Efficient cleaning and etching of high aspect ratio structures

Ultrahigh selective nitride etch to form FinFET devices

In situ vapor deposition polymerization to form polymers as precurs...

Metal doped carbon based hard mask removal in semiconductor fabrica...

Plasma apparatus for high aspect ratio selective lateral etch using...

High aspect ratio selective lateral etch using cyclic passivation a...

Integrated apparatus for efficient removal of halogen residues from...

Method of particle contaminant removal

Method for substrate cleaning including movement of substrate below...

Method of particle contaminant removal

Multi-stage substrate cleaning method and apparatus

Multi-stage substrate cleaning method and apparatus

System and method for monitoring wafer stress

Method for controlling corrosion of a substrate

Apparatus and system for cleaning substrate

Method for removing a halogen-containing residue

Integrated method and apparatus for efficient removal of halogen re...

Method and apparatus for performing hydrogen optical emission endpo...

Cleaning of native oxide with hydrogen-containing radicals

Method and apparatus for removing a halogen-containing residue

Method of photoresist removal in the presence of a dielectric layer...

Substrate cleaning apparatus and method

Solvent free photoresist strip and residue removal processing for p...

Patents Applicationslast 30 patents

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

OPTIMIZING EDGE RADICAL FLUX IN A DOWNSTREAM PLASMA CHAMBER

SELECTIVE SILICON TRIM BY THERMAL ETCHING

SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS

RAPID AND PRECISE TEMPERATURE CONTROL FOR THERMAL ETCHING

ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES

EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES

VAPOR CLEANING OF SUBSTRATE SURFACES

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

EFFICIENT CLEANING AND ETCHING OF HIGH ASPECT RATIO STRUCTURES

HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...

SYSTEMS AND METHODS FOR PLASMA-LESS DE-HALOGENATION

HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION A...

IN SITU VAPOR DEPOSITION POLYMERIZATION TO FORM POLYMERS AS PRECURS...

METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...

ULTRAHIGH SELECTIVE NITRIDE ETCH TO FORM FINFET DEVICES

SYSTEM AND METHOD FOR MONITORING WAFER STRESS

MULTI-STAGE SUBSTRATE CLEANING METHOD AND APPARATUS

SYSTEM AND METHOD FOR MONITORING WAFER STRESS

Apparatus and System for Cleaning Substrate

METHOD OF PARTICLE CONTAMINANT REMOVAL

Multi-Stage Substrate Cleaning Method and Apparatus

APPARATUS AND SYSTEM FOR CLEANING SUBSTRATE

APPARATUS AND METHOD FOR USING A VISCOELASTIC CLEANING MATERIAL TO...

Method of Particle Contaminant Removal

METHOD AND APPARATUS FOR TUNABLE ISOTROPIC RECESS ETCHING OF SILICO...

INTEGRATED APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM...