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Mark S. Lucas
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Groton, MA, US
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last 30 patents
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Patent Grant
Reticle alignment system for use in lithography
Patent number
6,483,572
Issue date
Nov 19, 2002
Azores Corporation
Craig R. Simpson
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Lithography System using dual substrate stages
Patent number
5,677,758
Issue date
Oct 14, 1997
MRS Technology, Inc.
Robert A. McEachern
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
Reticle alignment system for use in lithography
Publication number
20020085189
Publication date
Jul 4, 2002
MRS Technology, Inc.
Craig R. Simpson
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY