Mark Steven Slezak

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Self-topcoating photoresist for photolithography
- Patent number 7,951,524
- Issue date May 31, 2011
- International Business Machines Corporation
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Radiation-Sensitive, Wet Developable Bottom Antireflective Coating...
- Publication number 20090098490
- Publication date Apr 16, 2009
- Victor Pham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY
- Publication number 20080193879
- Publication date Aug 14, 2008
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...