Markus Franciscus Antonius Eurlings

Person

Tilburg, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method of measuring a parameter of a patterning process, metrology...
- Patent number 11,150,563
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Sergei Sokolov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for pupil illumination in overlay and critical di...
- Patent number 10,754,259
- Issue date Aug 25, 2020
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Beam homogenizer, illumination system and metrology system
- Patent number 10,495,889
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam delivery for EUV lithography
- Patent number 10,289,006
- Issue date May 14, 2019
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 10,222,702
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,222,703
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,835,950
- Issue date Dec 5, 2017
- ASML Netherland B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,778,575
- Issue date Oct 3, 2017
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 9,645,500
- Issue date May 9, 2017
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,250,536
- Issue date Feb 2, 2016
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method for reducing stray radiation
- Patent number 9,188,881
- Issue date Nov 17, 2015
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,937,706
- Issue date Jan 20, 2015
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,830,444
- Issue date Sep 9, 2014
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation conduit for radiation source
- Patent number 8,680,493
- Issue date Mar 25, 2014
- ASML Netherlands B.V.
- Maikel Adrianus Cornelis Schepers
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,587,766
- Issue date Nov 19, 2013
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Patent number 7,057,711
- Issue date Jun 6, 2006
- ASML Holding N.V.
- Santiago del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illuminator for a lithography apparatus, a lithography apparatus co...
- Patent number 6,833,907
- Issue date Dec 21, 2004
- ASML Netherlands B.V.
- Markus F Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Patent number 6,826,451
- Issue date Nov 30, 2004
- ASML Holding N.V.
- Santiago del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 6,741,329
- Issue date May 25, 2004
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, device manufac...
- Patent number 6,737,662
- Issue date May 18, 2004
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a lithographic apparatus, lithographic apparatu...
- Patent number 6,710,856
- Issue date Mar 23, 2004
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illuminator for a lithography apparatus, a lithography apparatus co...
- Patent number 6,671,035
- Issue date Dec 30, 2003
- ASML Netherlands B.V.
- Markus F Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 6,583,855
- Issue date Jun 24, 2003
- ASML Netherlands B.V.
- Jan Jaap Krikke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MEASURING A PARAMETER OF A PATTERNING PROCESS, METROLOGY...
- Publication number 20200192230
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Sergei SOKOLOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Device for Pupil Illumination in Overlay and Critical Di...
- Publication number 20190155172
- Publication date May 23, 2019
- ASML Holding N.V.
- Yevgeniy Konstantinovich SHMAREV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Source
- Publication number 20180031979
- Publication date Feb 1, 2018
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170315450
- Publication date Nov 2, 2017
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam Homogenizer, Illumination System and Metrology System
- Publication number 20170248794
- Publication date Aug 31, 2017
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius EURLINGS
- G02 - OPTICS
Information Patent Application
Radiation Source
- Publication number 20160334711
- Publication date Nov 17, 2016
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius EURLINGS
- G02 - OPTICS
Information Patent Application
RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
- Publication number 20160195819
- Publication date Jul 7, 2016
- ASML NETHERLANDS B.V.
- Oscar Franciscus Jozephus NOORDMAN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20160116848
- Publication date Apr 28, 2016
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam Delivery for EUV Lithography
- Publication number 20150334813
- Publication date Nov 19, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20130194562
- Publication date Aug 1, 2013
- ASML NETHERLANDS B.V.
- Hendrik Antony Johannes Neerhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050146702
- Publication date Jul 7, 2005
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical attenuator device, radiation system and lithographic appara...
- Publication number 20050140957
- Publication date Jun 30, 2005
- ASML NETHERLANDS B.V.
- Cornelis Petrus Andreas Marie Luijkx
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Publication number 20050057740
- Publication date Mar 17, 2005
- ASML Holding N.V.
- Santiago Del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device manufacturing method, mask set for use in the method, data s...
- Publication number 20050005257
- Publication date Jan 6, 2005
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for performing model-based layout conversion f...
- Publication number 20040142251
- Publication date Jul 22, 2004
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining parameters for lithographic projection, a co...
- Publication number 20040137343
- Publication date Jul 15, 2004
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and device manu...
- Publication number 20040108467
- Publication date Jun 10, 2004
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Publication number 20040019408
- Publication date Jan 29, 2004
- ASML US, Inc.
- Santiago del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illuminator for a lithography apparatus, a lithography apparatus co...
- Publication number 20030214643
- Publication date Nov 20, 2003
- ASML NETHERLANDS B.V.
- Markus F. Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask for use in lithography, method of making a mask, lithographic...
- Publication number 20030180632
- Publication date Sep 25, 2003
- ASML NETHERLANDS, B.V.
- Markus Franciscus Antonius Eurlings
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of removing assist features utilized to improve process lati...
- Publication number 20030170565
- Publication date Sep 11, 2003
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, device manufac...
- Publication number 20030038225
- Publication date Feb 27, 2003
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Markus Franciscus Antonius Eurlings

Person

Patents Grantslast 30 patents

Method of measuring a parameter of a patterning process, metrology...

Method and device for pupil illumination in overlay and critical di...

Beam homogenizer, illumination system and metrology system

Beam delivery for EUV lithography

Radiation source

Lithographic apparatus and method

Radiation source

Lithographic apparatus and method

Radiation source and lithographic apparatus

Lithographic apparatus and method

Lithographic apparatus and method for reducing stray radiation

Lithographic apparatus and method

Lithographic apparatus and method

Radiation conduit for radiation source

Lithographic apparatus and device manufacturing method

Lithography tool having a vacuum reticle library coupled to a vacuu...

Illuminator for a lithography apparatus, a lithography apparatus co...

Lithography tool having a vacuum reticle library coupled to a vacuu...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, device manufac...

Method of operating a lithographic apparatus, lithographic apparatu...

Illuminator for a lithography apparatus, a lithography apparatus co...

Lithographic apparatus, device manufacturing method, and device man...

Patents Applicationslast 30 patents

METHOD OF MEASURING A PARAMETER OF A PATTERNING PROCESS, METROLOGY...

Method and Device for Pupil Illumination in Overlay and Critical Di...

Radiation Source

LITHOGRAPHIC APPARATUS AND METHOD

Beam Homogenizer, Illumination System and Metrology System

Radiation Source

RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND METHOD

Beam Delivery for EUV Lithography

Lithographic Apparatus and Device Manufacturing Method

Lithographic apparatus and device manufacturing method

Optical attenuator device, radiation system and lithographic appara...

Lithography tool having a vacuum reticle library coupled to a vacuu...

Device manufacturing method, mask set for use in the method, data s...

Method and apparatus for performing model-based layout conversion f...

Method for determining parameters for lithographic projection, a co...

Lithographic apparatus, device manufacturing method and device manu...

Lithography tool having a vacuum reticle library coupled to a vacuu...

Illuminator for a lithography apparatus, a lithography apparatus co...

Mask for use in lithography, method of making a mask, lithographic...

Method of removing assist features utilized to improve process lati...

Lithographic apparatus, device manufacturing method, device manufac...