Markus Franciscus Antonius Eurlings

Person

Breda, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Device manufacturing method and mask for use therein
- Patent number 8,252,487
- Issue date Aug 28, 2012
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model-based layout conversion f...
- Patent number 7,985,515
- Issue date Jul 26, 2011
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus, method and program product for suppressing waviness of f...
- Patent number 7,856,606
- Issue date Dec 21, 2010
- ASML Masktools B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model-based layout conversion f...
- Patent number 7,666,554
- Issue date Feb 23, 2010
- ASML Masktools, B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,525,642
- Issue date Apr 28, 2009
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction using chamfers and rounding at corners
- Patent number 7,355,681
- Issue date Apr 8, 2008
- ASML Masktools B.V.
- Thomas Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus, method and computer program product for performing a mod...
- Patent number 7,349,066
- Issue date Mar 25, 2008
- ASML Masktools B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,333,178
- Issue date Feb 19, 2008
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method, mask set for use in the method, data s...
- Patent number 7,316,870
- Issue date Jan 8, 2008
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,224,440
- Issue date May 29, 2007
- ASML Netherlands B.V.
- Stefan Geerte Kruijswijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,177,010
- Issue date Feb 13, 2007
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,148,952
- Issue date Dec 12, 2006
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model-based layout conversion f...
- Patent number 7,138,212
- Issue date Nov 21, 2006
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation system, lithographic apparatus, device manufacturing meth...
- Patent number 7,113,261
- Issue date Sep 26, 2006
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical attenuator device, radiation system and lithographic appara...
- Patent number 7,030,958
- Issue date Apr 18, 2006
- ASML Netherlands B.V.
- Cornelis Petrus Andreas Marie Luijkx
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining parameters for lithographic projection, a co...
- Patent number 7,026,082
- Issue date Apr 11, 2006
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and device manu...
- Patent number 7,015,491
- Issue date Mar 21, 2006
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for use in lithography, method of making a mask, lithographic...
- Patent number 6,927,004
- Issue date Aug 9, 2005
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of removing assist features utilized to improve process lati...
- Patent number 6,875,545
- Issue date Apr 5, 2005
- ASML Masktools B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
- Publication number 20130001442
- Publication date Jan 3, 2013
- ASML NETHERLANDS B.V.
- Maikel Adrianus Cornelis Schepers
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20120147346
- Publication date Jun 14, 2012
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR REDUCING STRAY RADIATION
- Publication number 20120075610
- Publication date Mar 29, 2012
- ASML NETHERLANDS B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PERFORMING MODEL-BASED LAYOUT CONVERSION F...
- Publication number 20100167183
- Publication date Jul 1, 2010
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090174877
- Publication date Jul 9, 2009
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and method
- Publication number 20080239268
- Publication date Oct 2, 2008
- ASML NETHERLANDS B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical element for use in lithography apparatus and method of cond...
- Publication number 20070058151
- Publication date Mar 15, 2007
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G02 - OPTICS
Information Patent Application
Apparatus, method and computer program product for performing a mod...
- Publication number 20060250589
- Publication date Nov 9, 2006
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060139599
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Stefan Geerte Kruijswijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060092397
- Publication date May 4, 2006
- ASML NETHERLANDS B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus, method and program product for suppressing waviness of f...
- Publication number 20060010417
- Publication date Jan 12, 2006
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical proximity correction using chamfers and rounding at corners
- Publication number 20050280800
- Publication date Dec 22, 2005
- Thomas Laiding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050270513
- Publication date Dec 8, 2005
- ASML NETHERLANDS B.V.
- Marcel Mathijs Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation system, lithographic apparatus, device manufacturing meth...
- Publication number 20050270511
- Publication date Dec 8, 2005
- ASML NETHERLANDS B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device manufacturing method and mask for use therein
- Publication number 20050136334
- Publication date Jun 23, 2005
- ASML NETHERLANDS B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20020036763
- Publication date Mar 28, 2002
- Jan Jaap Krikke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of operating a lithographic apparatus, lithographic apparatu...
- Publication number 20020027648
- Publication date Mar 7, 2002
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Markus Franciscus Antonius Eurlings

Person

Patents Grantslast 30 patents

Device manufacturing method and mask for use therein

Method and apparatus for performing model-based layout conversion f...

Apparatus, method and program product for suppressing waviness of f...

Method and apparatus for performing model-based layout conversion f...

Lithographic apparatus and device manufacturing method

Optical proximity correction using chamfers and rounding at corners

Apparatus, method and computer program product for performing a mod...

Lithographic apparatus and device manufacturing method

Device manufacturing method, mask set for use in the method, data s...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Method and apparatus for performing model-based layout conversion f...

Radiation system, lithographic apparatus, device manufacturing meth...

Optical attenuator device, radiation system and lithographic appara...

Method for determining parameters for lithographic projection, a co...

Lithographic apparatus, device manufacturing method and device manu...

Mask for use in lithography, method of making a mask, lithographic...

Method of removing assist features utilized to improve process lati...

Patents Applicationslast 30 patents

RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

Lithographic Apparatus and Method

LITHOGRAPHIC APPARATUS AND METHOD FOR REDUCING STRAY RADIATION

METHOD AND APPARATUS FOR PERFORMING MODEL-BASED LAYOUT CONVERSION F...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic apparatus and method

Optical element for use in lithography apparatus and method of cond...

Apparatus, method and computer program product for performing a mod...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Apparatus, method and program product for suppressing waviness of f...

Optical proximity correction using chamfers and rounding at corners

Lithographic apparatus and device manufacturing method

Radiation system, lithographic apparatus, device manufacturing meth...

Device manufacturing method and mask for use therein

Lithographic apparatus, device manufacturing method, and device man...

Method of operating a lithographic apparatus, lithographic apparatu...