Markus Raab

Person

Schillingsfuerst, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical assembly, projection exposure apparatus and method
- Patent number 12,313,978
- Issue date May 27, 2025
- Carl Zeiss SMT GmbH
- Andreas Raba
- G02 - OPTICS
Information Patent Grant
Optical system and lithography apparatus
- Patent number 12,130,557
- Issue date Oct 29, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT AND PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR...
- Publication number 20250130504
- Publication date Apr 24, 2025
- Carl Zeiss SMT GMBH
- Dieter Bader
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS
- Publication number 20250110413
- Publication date Apr 3, 2025
- Carl Zeiss SMT GMBH
- Markus RAAB
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND METHOD FOR DESIGNING A COMPONENT...
- Publication number 20240085800
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Thilo Pollak
- G02 - OPTICS
Information Patent Application
OPTICAL DEVICE, METHOD FOR ADJUSTING A SETPOINT DEFORMATION AND LIT...
- Publication number 20240085783
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Markus Raab
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20240012334
- Publication date Jan 11, 2024
- Carl Zeiss SMT GMBH
- Markus Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MEASURING ACTUATORS IN A PROJECTION EXPOSURE...
- Publication number 20230228798
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Markus Raab
- G01 - MEASURING TESTING
Information Patent Application
ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
- Publication number 20230229091
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Matthias Manger
- G01 - MEASURING TESTING
Information Patent Application
ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
- Publication number 20230229092
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...
- Publication number 20230176486
- Publication date Jun 8, 2023
- Carl Zeiss SMT GMBH
- Markus Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20220382166
- Publication date Dec 1, 2022
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD
- Publication number 20220382165
- Publication date Dec 1, 2022
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Markus Raab

Person

Patents Grantslast 30 patents

Optical assembly, projection exposure apparatus and method

Optical system and lithography apparatus

Patents Applicationslast 30 patents

OPTICAL ELEMENT AND PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR...

METHOD FOR COMPENSATING ACTUATOR EFFECTS OF ACTUATORS

PROJECTION EXPOSURE APPARATUS AND METHOD FOR DESIGNING A COMPONENT...

OPTICAL DEVICE, METHOD FOR ADJUSTING A SETPOINT DEFORMATION AND LIT...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

METHOD AND DEVICE FOR MEASURING ACTUATORS IN A PROJECTION EXPOSURE...

ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY

ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY

OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...

OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

OPTICAL ASSEMBLY, PROJECTION EXPOSURE APPARATUS AND METHOD