Markus Schultheis

Person

Fulda, DE

People

Patents Grantslast 30 patents

Information Patent Grant
NiW(X) sputtering target with improved structure
- Patent number 11,566,320
- Issue date Jan 31, 2023
- Materion Advanced Materials Germany GmbH
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Double-layer system comprising a partially absorbing layer, and met...
- Patent number 10,487,392
- Issue date Nov 26, 2019
- MATERION ADVANCED MATERIALS GERMANY GMBH
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Zirconium oxide based sputtering target
- Patent number 10,347,472
- Issue date Jul 9, 2019
- MATERION ADVANCED MATERIALS GERMANY GMBH
- Christoph Simons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Planar or tubular sputtering target and method for the production t...
- Patent number 8,974,707
- Issue date Mar 10, 2015
- Heraeus Deutschland GmbH & Co. KG
- Martin Schlott
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputter target based on titanium dioxide
- Patent number 7,431,808
- Issue date Oct 7, 2008
- W.C. Heraeus GmbH & Co., KG
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
NiW(X) Sputtering Target with Improved Structure
- Publication number 20210156023
- Publication date May 27, 2021
- Materion Advanced Materials Germany GmbH
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYLINDRICAL TITANIUM OXIDE SPUTTERING TARGET AND PROCESS FOR MANUFA...
- Publication number 20200002235
- Publication date Jan 2, 2020
- Materion Advanced Materials Germany GmbH
- Markus Schultheis
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
PROCESS FOR PREPARATION OF THE INTERMETALLIC COMPOUND Nb3Sn BY MELT...
- Publication number 20190161829
- Publication date May 30, 2019
- Heraeus Deutschland GmbH & Co. KG
- Bernd Spaniol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE-LAYER SYSTEM COMPRISING A PARTIALLY ABSORBING LAYER, AND MET...
- Publication number 20180223418
- Publication date Aug 9, 2018
- Heraeus Deutschland GmbH & Co. KG
- Martin SCHLOTT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ZIRCONIUM OXIDE BASED SPUTTERING TARGET
- Publication number 20180155820
- Publication date Jun 7, 2018
- Materion Advanced Materials Germany GmbH
- Christoph Simons
- C01 - INORGANIC CHEMISTRY
Information Patent Application
CuSn, CuZn AND Cu2ZnSn SPUTTER TARGETS
- Publication number 20170062193
- Publication date Mar 2, 2017
- Heraeus Deutschland GmbH & Co. KG
- Markus SCHULTHEIS
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
LIGHT-ABSORBING LAYER AND LAYER SYSTEM CONTAINING THE LAYER, METHOD...
- Publication number 20160070033
- Publication date Mar 10, 2016
- Heraeus Deutschland GmbH & Co. KG
- Martin SCHLOTT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLANAR OR TUBULAR SPUTTERING TARGET AND METHOD FOR THE PRODUCTION T...
- Publication number 20130264200
- Publication date Oct 10, 2013
- HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
- Martin SCHLOTT
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
COLD-PRESSED SPUTTER TARGETS
- Publication number 20090277777
- Publication date Nov 12, 2009
- W.C. Heraeus GmbH
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUBULAR TARGET HAVING A CONNECTING LAYER ARRANGED BETWEEN THE TARGE...
- Publication number 20090250337
- Publication date Oct 8, 2009
- W.C. Heraeus GmbH
- Christoph Simons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MATERIAL MIXTURE, SPUTTER TARGET AND METHOD FOR PRODUCING A SPUTTER...
- Publication number 20080187453
- Publication date Aug 7, 2008
- W.C. Heraeus GmbH
- Markus SCHULTHEIS
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputter Target With High-Melting Phase
- Publication number 20070240981
- Publication date Oct 18, 2007
- W.C. Heraeus GmbH
- Martin SCHLOTT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tubular sputtering target
- Publication number 20060151320
- Publication date Jul 13, 2006
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputter target based on titanium dioxide
- Publication number 20030038028
- Publication date Feb 27, 2003
- W.C. Heraeus GmbH & Co.KG
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Markus Schultheis

Person

Patents Grantslast 30 patents

NiW(X) sputtering target with improved structure

Double-layer system comprising a partially absorbing layer, and met...

Zirconium oxide based sputtering target

Planar or tubular sputtering target and method for the production t...

Sputter target based on titanium dioxide

Patents Applicationslast 30 patents

NiW(X) Sputtering Target with Improved Structure

CYLINDRICAL TITANIUM OXIDE SPUTTERING TARGET AND PROCESS FOR MANUFA...

PROCESS FOR PREPARATION OF THE INTERMETALLIC COMPOUND Nb3Sn BY MELT...

DOUBLE-LAYER SYSTEM COMPRISING A PARTIALLY ABSORBING LAYER, AND MET...

ZIRCONIUM OXIDE BASED SPUTTERING TARGET

CuSn, CuZn AND Cu2ZnSn SPUTTER TARGETS

LIGHT-ABSORBING LAYER AND LAYER SYSTEM CONTAINING THE LAYER, METHOD...

PLANAR OR TUBULAR SPUTTERING TARGET AND METHOD FOR THE PRODUCTION T...

COLD-PRESSED SPUTTER TARGETS

TUBULAR TARGET HAVING A CONNECTING LAYER ARRANGED BETWEEN THE TARGE...

MATERIAL MIXTURE, SPUTTER TARGET AND METHOD FOR PRODUCING A SPUTTER...

Sputter Target With High-Melting Phase

Tubular sputtering target

Sputter target based on titanium dioxide