Markus Schwab

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatuses for designing optical systems using machine...
- Patent number 11,226,481
- Issue date Jan 18, 2022
- Cad Zeiss AG
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imaging optical unit and projection exposure unit including same
- Patent number 10,656,400
- Issue date May 19, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Projection optical unit for imaging an object field into an image f...
- Patent number 10,558,026
- Issue date Feb 11, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical unit for EUV projection lithography
- Patent number 10,545,323
- Issue date Jan 28, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Imaging optical unit and projection exposure apparatus including same
- Patent number 10,527,832
- Issue date Jan 7, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component for use in a radiation source module of a project...
- Patent number 10,288,894
- Issue date May 14, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus including mechanism to reduce influen...
- Patent number 10,162,267
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical unit for imaging an object field into an image f...
- Patent number 10,146,033
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Illumination system and projection objective of a mask inspection a...
- Patent number 10,114,293
- Issue date Oct 30, 2018
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with wavefront measuring device and o...
- Patent number 10,012,911
- Issue date Jul 3, 2018
- Carl Zeiss SMT GmbH
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,983,483
- Issue date May 29, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for microlithography comprising an op...
- Patent number 9,759,550
- Issue date Sep 12, 2017
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for microlithography comprising an op...
- Patent number 9,714,822
- Issue date Jul 25, 2017
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,678,438
- Issue date Jun 13, 2017
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for a microlithographic projection exposure apparatus
- Patent number 9,535,331
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,477,157
- Issue date Oct 25, 2016
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,213,244
- Issue date Dec 15, 2015
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,170,499
- Issue date Oct 27, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,046,786
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,928,859
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 8,767,181
- Issue date Jul 1, 2014
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a miniaturized device
- Patent number 8,542,342
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for a microlithography projection exposure appa...
- Patent number 8,537,335
- Issue date Sep 17, 2013
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 8,264,668
- Issue date Sep 11, 2012
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G02 - OPTICS
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 7,847,921
- Issue date Dec 7, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method for operating the same
- Patent number 7,808,615
- Issue date Oct 5, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Method of manufacturing a miniaturized device
- Patent number 7,508,489
- Issue date Mar 24, 2009
- Carl Zeiss SMT AG
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 7,408,616
- Issue date Aug 5, 2008
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DISPLAY DEVICE
- Publication number 20240231107
- Publication date Jul 11, 2024
- Tooz Technologies GmbH
- Markus SCHWAB
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20190121107
- Publication date Apr 25, 2019
- Carl Zeiss SMT GMBH
- Markus Schwab
- G02 - OPTICS
Information Patent Application
METHODS AND APPARATUSES FOR DESIGNING OPTICAL SYSTEMS
- Publication number 20190094532
- Publication date Mar 28, 2019
- Carl-Zeiss AG
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROJECTION OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE F...
- Publication number 20190025562
- Publication date Jan 24, 2019
- Carl Zeiss SMT GMBH
- Markus Schwab
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS INCLUDING SAME
- Publication number 20180088303
- Publication date Mar 29, 2018
- Carl Zeiss SMT GMBH
- Markus Schwab
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE UNIT INCLUDING SAME
- Publication number 20180074303
- Publication date Mar 15, 2018
- Carl Zeiss SMT GMBH
- Markus Schwab
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH WAVEFRONT MEASURING DEVICE AND O...
- Publication number 20170336714
- Publication date Nov 23, 2017
- Carl Zeiss SMT GMBH
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT
- Publication number 20170293154
- Publication date Oct 12, 2017
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20170038691
- Publication date Feb 9, 2017
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE F...
- Publication number 20160085061
- Publication date Mar 24, 2016
- Carl Zeiss SMT GMBH
- Markus Schwab
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20160070176
- Publication date Mar 10, 2016
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS INCLUDING MECHANISM TO REDUCE INFLUEN...
- Publication number 20150316854
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20150234291
- Publication date Aug 20, 2015
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN OP...
- Publication number 20150198437
- Publication date Jul 16, 2015
- Carl Zeiss SMT GMBH
- Alexander Wolf
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20150153654
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20150029477
- Publication date Jan 29, 2015
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20130114060
- Publication date May 9, 2013
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20130057844
- Publication date Mar 7, 2013
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...
- Publication number 20130038850
- Publication date Feb 14, 2013
- CARL ZEISS SMT GMBH
- Heiko Feldmann
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120293786
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPA...
- Publication number 20110102758
- Publication date May 5, 2011
- Carl Zeiss SMT GMBH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20110069296
- Publication date Mar 24, 2011
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20100002217
- Publication date Jan 7, 2010
- Carl Zeiss SMT AG
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING A MINIATURIZED DEVICE
- Publication number 20090190116
- Publication date Jul 30, 2009
- Carl Zeiss SMT AG
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM INCLUDING AN OPTICAL FILTER
- Publication number 20090040495
- Publication date Feb 12, 2009
- Carl Zeiss SMT AG
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20090040496
- Publication date Feb 12, 2009
- Carl Zeiss
- Toralf GRUNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20080002167
- Publication date Jan 3, 2008
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Application
Polarization-optimized illumination system
- Publication number 20070024972
- Publication date Feb 1, 2007
- Carl Zeiss SMT AG
- Birgit Kuerz
- G02 - OPTICS
Information Patent Application
Method of manufacturing a miniaturized device
- Publication number 20060146304
- Publication date Jul 6, 2006
- Carl Zeiss SMT AG
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microlithographic exposure method as well as a projection exposure...
- Publication number 20050146704
- Publication date Jul 7, 2005
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Markus Schwab

Person

Patents Grantslast 30 patents

Methods and apparatuses for designing optical systems using machine...

Imaging optical unit and projection exposure unit including same

Projection optical unit for imaging an object field into an image f...

Projection optical unit for EUV projection lithography

Imaging optical unit and projection exposure apparatus including same

Optical component for use in a radiation source module of a project...

Projection exposure apparatus including mechanism to reduce influen...

Projection optical unit for imaging an object field into an image f...

Illumination system and projection objective of a mask inspection a...

Projection exposure apparatus with wavefront measuring device and o...

Illumination system of a microlithographic projection exposure appa...

Projection exposure apparatus for microlithography comprising an op...

Projection exposure apparatus for microlithography comprising an op...

Illumination system of a microlithographic projection exposure appa...

Optical system for a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Microlithographic exposure method as well as a projection exposure...

Method of manufacturing a miniaturized device

Illumination system for a microlithography projection exposure appa...

Illumination system of a microlithographic projection exposure appa...

Microlithographic exposure method as well as a projection exposure...

Projection exposure apparatus and method for operating the same

Method of manufacturing a miniaturized device

Microlithographic exposure method as well as a projection exposure...

Patents Applicationslast 30 patents

DISPLAY DEVICE

PROJECTION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

METHODS AND APPARATUSES FOR DESIGNING OPTICAL SYSTEMS

PROJECTION OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE F...

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS INCLUDING SAME

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE UNIT INCLUDING SAME

PROJECTION EXPOSURE APPARATUS WITH WAVEFRONT MEASURING DEVICE AND O...

OPTICAL COMPONENT

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

PROJECTION OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE F...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

PROJECTION EXPOSURE APPARATUS INCLUDING MECHANISM TO REDUCE INFLUEN...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN OP...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPA...

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

METHOD OF MANUFACTURING A MINIATURIZED DEVICE

ILLUMINATION SYSTEM INCLUDING AN OPTICAL FILTER

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME

Polarization-optimized illumination system

Method of manufacturing a miniaturized device

Microlithographic exposure method as well as a projection exposure...