Marlon Edward Menezes

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low temperature process for depositing a high extinction coefficien...
- Patent number 8,338,316
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Vijay Parihar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dopant activation in doped semiconductor substrates
- Patent number 7,989,366
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Jeffrey C. Munro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature process for depositing a high extinction coefficien...
- Patent number 7,968,473
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Vijay Parihar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post deposition plasma treatment to increase tensile stress of HDP-...
- Patent number 7,745,351
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic surface annealing of implanted dopants with low temperature...
- Patent number 7,588,990
- Issue date Sep 15, 2009
- Applied Materials, Inc.
- Vijay Parihar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post deposition plasma treatment to increase tensile stress of HDP-...
- Patent number 7,465,680
- Issue date Dec 16, 2008
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
LOW TEMPERATURE PROCESS FOR DEPOSITING A HIGH EXTINCTION COEFFICIEN...
- Publication number 20110223773
- Publication date Sep 15, 2011
- APPLIED MATERIALS, INC.
- Vijay Parihar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST DEPOSITION PLASMA TREATMENT TO INCREASE TENSILE STRESS OF HDP-...
- Publication number 20090035918
- Publication date Feb 5, 2009
- Applies Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE PROCESS FOR DEPOSITING A HIGH EXTINCTION COEFFICIEN...
- Publication number 20080108210
- Publication date May 8, 2008
- Vijay Parihar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPANT ACTIVATION IN DOPED SEMICONDUCTOR SUBSTRATES
- Publication number 20080057740
- Publication date Mar 6, 2008
- Applied Materials, Inc.
- Jeffrey C. Munro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC SURFACE ANNEALING OF IMPLANTED DOPANTS WITH LOW TEMPERATURE...
- Publication number 20080057681
- Publication date Mar 6, 2008
- Vijay Parihar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post deposition plasma treatment to increase tensile stress of HDP-...
- Publication number 20070054504
- Publication date Mar 8, 2007
- Applied Materials, Inc.
- Xiaolin Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for accelerating process stability of high tem...
- Publication number 20020144783
- Publication date Oct 10, 2002
- APPLIED MATERIALS, INC.
- Truc Tran
- H01 - BASIC ELECTRIC ELEMENTS

Marlon Edward Menezes

Person

Patents Grantslast 30 patents

Low temperature process for depositing a high extinction coefficien...

Dopant activation in doped semiconductor substrates

Low temperature process for depositing a high extinction coefficien...

Post deposition plasma treatment to increase tensile stress of HDP-...

Dynamic surface annealing of implanted dopants with low temperature...

Post deposition plasma treatment to increase tensile stress of HDP-...

Patents Applicationslast 30 patents

LOW TEMPERATURE PROCESS FOR DEPOSITING A HIGH EXTINCTION COEFFICIEN...

POST DEPOSITION PLASMA TREATMENT TO INCREASE TENSILE STRESS OF HDP-...

LOW TEMPERATURE PROCESS FOR DEPOSITING A HIGH EXTINCTION COEFFICIEN...

DOPANT ACTIVATION IN DOPED SEMICONDUCTOR SUBSTRATES

DYNAMIC SURFACE ANNEALING OF IMPLANTED DOPANTS WITH LOW TEMPERATURE...

Post deposition plasma treatment to increase tensile stress of HDP-...

Apparatus and method for accelerating process stability of high tem...