Martijn Maria ZAAL

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Veldhoven, NL

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,710,668
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,604,419
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of determining information about a patterning process, metho...
- Patent number 11,022,897
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Joannes Jitse Venselaar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,811,323
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of optimizing a metrology process
- Patent number 10,585,354
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for determining adjustments to sensitivity parame...
- Patent number 10,520,830
- Issue date Dec 31, 2019
- ASML Netherlands B.V.
- Harm Hubertus Joseph Elizabeth Kicken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210035871
- Publication date Feb 4, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OPTIMIZING A METROLOGY PROCESS
- Publication number 20190243253
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Anagnostis TSIATMAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR DETERMINING ADJUSTMENTS TO SENSITIVITY PARAME...
- Publication number 20190204755
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Harm Hubertus Joseph Elizabeth KICKEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHO...
- Publication number 20190171115
- Publication date Jun 6, 2019
- ASML NETHERLANDS B.V.
- Joannes Jitse VENSELAAR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20170255112
- Publication date Sep 7, 2017
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING