Martin D. Tabat

Person

Nashua, NH, US

People

Patents Grantslast 30 patents

Information Patent Grant
Tuning gas cluster ion beam systems
- Patent number 11,715,620
- Issue date Aug 1, 2023
- TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Matthew Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensated location specific processing apparatus and method
- Patent number 10,861,674
- Issue date Dec 8, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensated location specific processing apparatus and method
- Patent number 10,497,540
- Issue date Dec 3, 2019
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam etching process for etching Si-containing, Ge-...
- Patent number 9,324,567
- Issue date Apr 26, 2016
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple nozzle gas cluster ion beam system
- Patent number 8,981,322
- Issue date Mar 17, 2015
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam etching process for metal-containing materials
- Patent number 8,557,710
- Issue date Oct 15, 2013
- TEL Epion Inc.
- Yan Shao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas cluster ion beam etching process for Si-containing and Ge-conta...
- Patent number 8,513,138
- Issue date Aug 20, 2013
- TEL Epion Inc.
- Yan Shao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam etching process for achieving target etch proc...
- Patent number 8,512,586
- Issue date Aug 20, 2013
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing hydrogenated diamond-like carbon films using...
- Patent number 8,455,060
- Issue date Jun 4, 2013
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of irradiating substrate with gas cluster ion beam formed fr...
- Patent number 8,304,033
- Issue date Nov 6, 2012
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching areas of a substrate using a gas clu...
- Patent number 8,202,435
- Issue date Jun 19, 2012
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple nozzle gas cluster ion beam processing system and method o...
- Patent number 8,097,860
- Issue date Jan 17, 2012
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for directional growth using a gas cluster ion beam
- Patent number 7,905,199
- Issue date Mar 15, 2011
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for reducing particulate contamination in gas...
- Patent number 7,642,531
- Issue date Jan 5, 2010
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of doped regions and/or ultra-shallow junctions in semico...
- Patent number 7,410,890
- Issue date Aug 12, 2008
- TEL Epion Inc.
- Allen R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming doped and un-doped strained semiconductor materi...
- Patent number 7,259,036
- Issue date Aug 21, 2007
- TEL Epion Inc.
- John O. Borland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved processing with a gas-cluster ion...
- Patent number 7,060,989
- Issue date Jun 13, 2006
- Epion Corporation
- David R. Swenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning and etching film layers of semiconductor devices
- Patent number 5,607,601
- Issue date Mar 4, 1997
- The Aerospace Corporation
- Gary L. Loper
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Tuning Gas Cluster Ion Beam Systems
- Publication number 20220359155
- Publication date Nov 10, 2022
- TEL Manufacturing and Engineering of America, Inc.
- Matthew Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SMOOTHING AND PLANARIZING OF ALTIC SURFACES
- Publication number 20200273715
- Publication date Aug 27, 2020
- TEL Manufacturing and Engineering of America, Inc.
- Luis Fernandez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compensated Location Specific Processing Apparatus And Method
- Publication number 20200066485
- Publication date Feb 27, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATED LOCATION SPECIFIC PROCESSING APPARATUS AND METHOD
- Publication number 20180197715
- Publication date Jul 12, 2018
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM ETCHING PROCESS
- Publication number 20150270135
- Publication date Sep 24, 2015
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM ETCHING PROCESS FOR ACHIEVING TARGET ETCH PROC...
- Publication number 20130309872
- Publication date Nov 21, 2013
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas Cluster Ion Beam Etching Process for Etching Si-Containing, Ge-...
- Publication number 20130196509
- Publication date Aug 1, 2013
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS CLUSTER ION BEAM ETCHING PROCESS FOR METAL-CONTAINING MATERIALS
- Publication number 20130059444
- Publication date Mar 7, 2013
- TEL EPION, INC.
- Yan SHAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS CLUSTER ION BEAM ETCHING PROCESS FOR Si-CONTAINING and Ge-CONTA...
- Publication number 20130059445
- Publication date Mar 7, 2013
- TEL EPION, INC.
- Yan SHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM ETCHING PROCESS FOR ACHIEVING TARGET ETCH PROC...
- Publication number 20130059446
- Publication date Mar 7, 2013
- TEL EPION, INC.
- Martin D. TABAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING HYDROGENATED DIAMOND-LIKE CARBON FILMS USING...
- Publication number 20100209627
- Publication date Aug 19, 2010
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING TRENCH ISOLATION USING GAS CLUSTER ION BEAM PROC...
- Publication number 20100193898
- Publication date Aug 5, 2010
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...
- Publication number 20100193708
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...
- Publication number 20100193472
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM
- Publication number 20100193701
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY ETCHING AREAS OF A SUBSTRATE USING A GAS CLU...
- Publication number 20100025365
- Publication date Feb 4, 2010
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR DIRECTIONAL GROWTH USING A GAS CLUSTER ION BEAM
- Publication number 20090314954
- Publication date Dec 24, 2009
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR DEPOSITING SILICON CARBIDE FILM USING A GAS C...
- Publication number 20090233004
- Publication date Sep 17, 2009
- TEL Epion Inc.
- Steven Sherman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF INTRODUCING MATERIAL INTO A SUBSTRATE BY GAS-CLUSTER ION...
- Publication number 20080245974
- Publication date Oct 9, 2008
- TEL Epion Inc.
- Allen R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR REDUCING PARTICULATE CONTAMINATION IN GAS...
- Publication number 20080048132
- Publication date Feb 28, 2008
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of doped regions and/or ultra-shallow junctions in semico...
- Publication number 20050277246
- Publication date Dec 15, 2005
- Epion Corporation
- Allen R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved processing with a gas-cluster ion...
- Publication number 20050205802
- Publication date Sep 22, 2005
- Epion Corporation
- David R. Swenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming doped and un-doped strained semiconductor and se...
- Publication number 20050181621
- Publication date Aug 18, 2005
- Epion Corporation
- John O. Borland
- H01 - BASIC ELECTRIC ELEMENTS

Martin D. Tabat

Person

Patents Grantslast 30 patents

Tuning gas cluster ion beam systems

Compensated location specific processing apparatus and method

Compensated location specific processing apparatus and method

Gas cluster ion beam etching process for etching Si-containing, Ge-...

Multiple nozzle gas cluster ion beam system

Gas cluster ion beam etching process for metal-containing materials

Gas cluster ion beam etching process for Si-containing and Ge-conta...

Gas cluster ion beam etching process for achieving target etch proc...

Method for depositing hydrogenated diamond-like carbon films using...

Method of irradiating substrate with gas cluster ion beam formed fr...

Method for selectively etching areas of a substrate using a gas clu...

Multiple nozzle gas cluster ion beam processing system and method o...

Method and system for directional growth using a gas cluster ion beam

Apparatus and method for reducing particulate contamination in gas...

Formation of doped regions and/or ultra-shallow junctions in semico...

Methods of forming doped and un-doped strained semiconductor materi...

Method and apparatus for improved processing with a gas-cluster ion...

Method for patterning and etching film layers of semiconductor devices

Patents Applicationslast 30 patents

Tuning Gas Cluster Ion Beam Systems

METHOD OF SMOOTHING AND PLANARIZING OF ALTIC SURFACES

Compensated Location Specific Processing Apparatus And Method

COMPENSATED LOCATION SPECIFIC PROCESSING APPARATUS AND METHOD

GAS CLUSTER ION BEAM ETCHING PROCESS

GAS CLUSTER ION BEAM ETCHING PROCESS FOR ACHIEVING TARGET ETCH PROC...

Gas Cluster Ion Beam Etching Process for Etching Si-Containing, Ge-...

GAS CLUSTER ION BEAM ETCHING PROCESS FOR METAL-CONTAINING MATERIALS

GAS CLUSTER ION BEAM ETCHING PROCESS FOR Si-CONTAINING and Ge-CONTA...

GAS CLUSTER ION BEAM ETCHING PROCESS FOR ACHIEVING TARGET ETCH PROC...

METHOD FOR DEPOSITING HYDROGENATED DIAMOND-LIKE CARBON FILMS USING...

METHOD FOR FORMING TRENCH ISOLATION USING GAS CLUSTER ION BEAM PROC...

METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM

METHOD FOR SELECTIVELY ETCHING AREAS OF A SUBSTRATE USING A GAS CLU...

METHOD AND SYSTEM FOR DIRECTIONAL GROWTH USING A GAS CLUSTER ION BEAM

METHOD AND SYSTEM FOR DEPOSITING SILICON CARBIDE FILM USING A GAS C...

METHOD OF INTRODUCING MATERIAL INTO A SUBSTRATE BY GAS-CLUSTER ION...

APPARATUS AND METHOD FOR REDUCING PARTICULATE CONTAMINATION IN GAS...

Formation of doped regions and/or ultra-shallow junctions in semico...

Method and apparatus for improved processing with a gas-cluster ion...

Methods of forming doped and un-doped strained semiconductor and se...