Martin Ebert

Person

Valkenswaard, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,580,274
- Issue date Feb 14, 2023
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for illumination adjustment
- Patent number 11,429,029
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,379,445
- Issue date Aug 13, 2019
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system, inspection apparatus including such an illumin...
- Patent number 10,338,401
- Issue date Jul 2, 2019
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,254,658
- Issue date Apr 9, 2019
- ASML Netherlands B.V.
- Daan Maurits Slotboom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,133,188
- Issue date Nov 20, 2018
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G02 - OPTICS
Information Patent Grant
Illumination system, inspection apparatus including such an illumin...
- Patent number 9,753,296
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of assessing a model of a substrate, an inspection apparatus...
- Patent number 8,830,472
- Issue date Sep 9, 2014
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20230185990
- Publication date Jun 15, 2023
- ASML NETHERLANDS B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT
- Publication number 20210055663
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190064677
- Publication date Feb 28, 2019
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan Jak
- G02 - OPTICS
Information Patent Application
POLARIZATION TUNING IN SCATTEROMETRY
- Publication number 20180364590
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
Illumination System, Inspection Apparatus Including Such an Illumin...
- Publication number 20180088347
- Publication date Mar 29, 2018
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20180046737
- Publication date Feb 15, 2018
- ASML NETHERLANDS B.V.
- Lotte Marloes WILLEMS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20170184977
- Publication date Jun 29, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method, Target and Substrate
- Publication number 20170090302
- Publication date Mar 30, 2017
- ASML NETHERLANDS B.V.
- DAAN MAURITS SLOTBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination System, Inspection Apparatus Including Such an Illumin...
- Publication number 20160025992
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G02 - OPTICS
Information Patent Application
Method of Assessing a Model of a Substrate, an Inspection Apparatus...
- Publication number 20110026032
- Publication date Feb 3, 2011
- ASML Netherland B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING

Martin Ebert

Person

Patents Grantslast 30 patents

Method and apparatus for inspection and metrology

Method and apparatus for illumination adjustment

Metrology method, target and substrate

Illumination system, inspection apparatus including such an illumin...

Metrology method, target and substrate

Metrology method, target and substrate

Illumination system, inspection apparatus including such an illumin...

Method of assessing a model of a substrate, an inspection apparatus...

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

METHOD AND APPARATUS FOR ILLUMINATION ADJUSTMENT

METROLOGY METHOD, TARGET AND SUBSTRATE

POLARIZATION TUNING IN SCATTEROMETRY

Illumination System, Inspection Apparatus Including Such an Illumin...

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

METROLOGY METHOD, TARGET AND SUBSTRATE

Metrology Method, Target and Substrate

Illumination System, Inspection Apparatus Including Such an Illumin...

Method of Assessing a Model of a Substrate, an Inspection Apparatus...