Martin Feldman

Person

Berkeley Heights, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Resolution confocal microscope, and device fabrication method using...
- Patent number 5,078,482
- Issue date Jan 7, 1992
- AT&T Bell Laboratories
- Martin Feldman
- G02 - OPTICS
Information Patent Grant
Resolution confocal microscope, and device fabrication method using...
- Patent number 5,004,321
- Issue date Apr 2, 1991
- AT&T Bell Laboratories
- Martin Feldman
- G02 - OPTICS
Information Patent Grant
Charged-particle-beam lithography
- Patent number 4,742,234
- Issue date May 3, 1988
- American Telephone and Telegraph Company, AT&T Bell Laboratories
- Martin Feldman
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Wafer chuck comprising a curved reference surface
- Patent number 4,724,222
- Issue date Feb 9, 1988
- American Telephone and Telegraph Company, AT&T Bell Laboratories
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two-dimensional imaging with line arrays
- Patent number 4,636,080
- Issue date Jan 13, 1987
- AT&T Bell Laboratories
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus tracking system
- Patent number 4,626,103
- Issue date Dec 2, 1986
- AT&T Bell Laboratories
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask-to-wafer alignment utilizing zone plates
- Patent number 4,614,433
- Issue date Sep 30, 1986
- AT&T Bell Laboratories
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection system utilizing dark-field illumination
- Patent number 4,595,289
- Issue date Jun 17, 1986
- AT&T Bell Laboratories
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer tilt compensation in zone plate alignment system
- Patent number 4,398,824
- Issue date Aug 16, 1983
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for aligning mask and wafer members
- Patent number 4,326,805
- Issue date Apr 27, 1982
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zone plate alignment marks
- Patent number 4,037,969
- Issue date Jul 26, 1977
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Proximity printing method
- Patent number 4,026,653
- Issue date May 31, 1977
- Bell Telephone Laboratories, Incorporated
- Jacob Appelbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for determining feature-size accuracy of circuit patterns
- Patent number 3,998,639
- Issue date Dec 21, 1976
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection of masks and wafers by image dissection
- Patent number 3,963,354
- Issue date Jun 15, 1976
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control of scanning laser beam
- Patent number 3,943,529
- Issue date Mar 9, 1976
- Bell Telephone Laboratories, Incorporated
- Martin Feldman
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Martin Feldman

Person

Patents Grantslast 30 patents

Resolution confocal microscope, and device fabrication method using...

Resolution confocal microscope, and device fabrication method using...

Charged-particle-beam lithography

Wafer chuck comprising a curved reference surface

Two-dimensional imaging with line arrays

Focus tracking system

Mask-to-wafer alignment utilizing zone plates

Inspection system utilizing dark-field illumination

Wafer tilt compensation in zone plate alignment system

Method and apparatus for aligning mask and wafer members

Zone plate alignment marks

Proximity printing method

Methods for determining feature-size accuracy of circuit patterns

Inspection of masks and wafers by image dissection

Control of scanning laser beam