Martin Glodde

Person

Pine Brook, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,964,541
- Issue date Mar 30, 2021
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase the lithographic process window of extreme ultra...
- Patent number 10,727,055
- Issue date Jul 28, 2020
- International Business Machines Corporation
- Nelson M. Felix
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,553,432
- Issue date Feb 4, 2020
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase the lithographic process window of extreme ultra...
- Patent number 10,388,521
- Issue date Aug 20, 2019
- International Business Machines Corporation
- Nelson M. Felix
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,312,087
- Issue date Jun 4, 2019
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adhesion of polymers on silicon substrates
- Patent number 10,170,301
- Issue date Jan 1, 2019
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,096,477
- Issue date Oct 9, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet strippable gap fill materials
- Patent number 9,671,694
- Issue date Jun 6, 2017
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process using a boron phosphorus silicon glass film
- Patent number 9,580,623
- Issue date Feb 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleanability assessment of sublimate from lithography materials
- Patent number 9,551,696
- Issue date Jan 24, 2017
- GLOBALFOUNDRIES Inc.
- Mark S. Chace
- B08 - CLEANING
Information Patent Grant
Near-infrared absorbing film compositions
- Patent number 9,465,290
- Issue date Oct 11, 2016
- GLOBALFOUNDRIES Inc.
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wet strip process for an antireflective coating layer
- Patent number 9,460,934
- Issue date Oct 4, 2016
- GLOBALFOUNDRIES Inc.
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deep well implant using blocking mask
- Patent number 9,431,250
- Issue date Aug 30, 2016
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Block mask litho on high aspect ratio topography with minimal semic...
- Patent number 9,425,053
- Issue date Aug 23, 2016
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Acid-strippable silicon-containing antireflective coating
- Patent number 9,348,228
- Issue date May 24, 2016
- GLOBALFOUNDRIES Inc.
- Martin Glodde
- G02 - OPTICS
Information Patent Grant
Dielectric tone inversion materials
- Patent number 9,337,033
- Issue date May 10, 2016
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dielectric tone inversion materials
- Patent number 9,281,212
- Issue date Mar 8, 2016
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Near-infrared absorptive layer-forming composition and multilayer film
- Patent number 9,069,245
- Issue date Jun 30, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G02 - OPTICS
Information Patent Grant
Silicon-containing antireflective coatings including non-polymeric...
- Patent number 8,999,625
- Issue date Apr 7, 2015
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning contacts in carbon nanotube devices
- Patent number 8,816,328
- Issue date Aug 26, 2014
- International Business Machines Corporation
- Josephine B Chang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Patterning contacts in carbon nanotube devices
- Patent number 8,803,129
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Josephine B Chang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Near-infrared absorbing film compositions
- Patent number 8,772,376
- Issue date Jul 8, 2014
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,759,220
- Issue date Jun 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Near-infrared absorptive layer-forming composition and multilayer f...
- Patent number 8,722,307
- Issue date May 13, 2014
- International Business Machines Corporation
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to transfer lithographic patterns into inorganic substrates
- Patent number 8,658,050
- Issue date Feb 25, 2014
- International Business Machines Corporation
- Sebastian Ulrich Engelmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators for extreme ultraviolet lithography
- Patent number 8,652,712
- Issue date Feb 18, 2014
- International Business Machines Corporation
- Martin Glodde
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Near-infrared absorbing film compositions
- Patent number 8,586,283
- Issue date Nov 19, 2013
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integration process to improve focus leveling within a lot process...
- Patent number 8,395,228
- Issue date Mar 12, 2013
- International Business Machines Corporation
- Wai-Kin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Near-infrared absorbing film compositions
- Patent number 8,293,451
- Issue date Oct 23, 2012
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators for extreme ultraviolet lithography
- Patent number 8,039,194
- Issue date Oct 18, 2011
- Internatinal Business Machines Corporation
- Martin Glodde
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20200090936
- Publication date Mar 19, 2020
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180337048
- Publication date Nov 22, 2018
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADHESION OF POLYMERS ON SILICON SUBSTRATES
- Publication number 20180286670
- Publication date Oct 4, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...
- Publication number 20180233353
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Nelson M. Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180233362
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...
- Publication number 20180233352
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Nelson M. Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180233363
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING PROCESS
- Publication number 20160276152
- Publication date Sep 22, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC TONE INVERSION MATERIALS
- Publication number 20160126097
- Publication date May 5, 2016
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLOCK MASK LITHO ON HIGH ASPECT RATIO TOPOGRAPHY WITH MINIMAL SEMIC...
- Publication number 20150380251
- Publication date Dec 31, 2015
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANABILITY ASSESSMENT OF SUBLIMATE FROM LITHOGRAPHY MATERIALS
- Publication number 20150369789
- Publication date Dec 24, 2015
- International Business Machines Corporation
- Mark S. Chace
- G01 - MEASURING TESTING
Information Patent Application
DEEP WELL IMPLANT USING BLOCKING MASK
- Publication number 20150255286
- Publication date Sep 10, 2015
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET STRIP PROCESS FOR AN ANTIREFLECTIVE COATING LAYER
- Publication number 20140273501
- Publication date Sep 18, 2014
- Shin-Etsu Chemical Company, Ltd
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING ANTIREFLECTIVE COATINGS INCLUDING NON-POLYMERIC...
- Publication number 20140227641
- Publication date Aug 14, 2014
- SHIN-ETSU CHEMICAL CO., LTD.
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEAR-INFRARED ABSORBING FILM COMPOSITIONS
- Publication number 20140210034
- Publication date Jul 31, 2014
- International Business Machines Corporation
- Wu-Song Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACID-STRIPPABLE SILICON-CONTAINING ANTIREFLECTIVE COATING
- Publication number 20140186774
- Publication date Jul 3, 2014
- International Business Machines Corporation
- Martin Glodde
- G02 - OPTICS
Information Patent Application
NEAR-INFRARED ABSORBING FILM COMPOSITION FOR LITHOGRAPHIC APPLICATION
- Publication number 20130157463
- Publication date Jun 20, 2013
- Shin-Etsu Chemical Co., Ltd.
- Dario L. Goldfarb
- G02 - OPTICS
Information Patent Application
Patterning Contacts in Carbon Nanotube Devices
- Publication number 20130089956
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Josephine B. Chang
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERNING CONTACTS IN CARBON NANOTUBE DEVICES
- Publication number 20130087767
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Josephine B. Chang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method to Transfer Lithographic Patterns Into Inorganic Substrates
- Publication number 20130026133
- Publication date Jan 31, 2013
- International Business Machines Corporation
- Sebastian Ulrich Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Near-Infrared Absorbing Film Compositions
- Publication number 20130001484
- Publication date Jan 3, 2013
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER F...
- Publication number 20120301828
- Publication date Nov 29, 2012
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel Integration Process to Improve Focus Leveling Within a Lot Pr...
- Publication number 20120112302
- Publication date May 10, 2012
- International Business Machines Corporation
- Wai-Kin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM
- Publication number 20110262862
- Publication date Oct 27, 2011
- Masaki OHASHI
- G02 - OPTICS
Information Patent Application
NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM
- Publication number 20110262863
- Publication date Oct 27, 2011
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoacid Generators for Extreme Ultraviolet Lithography
- Publication number 20110143099
- Publication date Jun 16, 2011
- International Business Machines Corporation
- Martin Glodde
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Near-Infrared Absorbing Film Compositions
- Publication number 20110042771
- Publication date Feb 24, 2011
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Near-Infrared Absorbing Film Compositions
- Publication number 20110042653
- Publication date Feb 24, 2011
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IONIC, ORGANIC PHOTOACID GENERATORS FOR DUV, MUV AND OPTICAL LITHOG...
- Publication number 20090176173
- Publication date Jul 9, 2009
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20090176175
- Publication date Jul 9, 2009
- International Business Machines Corporation
- Martin Glodde
- C07 - ORGANIC CHEMISTRY

Martin Glodde

Person

Patents Grantslast 30 patents

Method to improve adhesion of photoresist on silicon substrate for...

Method to increase the lithographic process window of extreme ultra...

Method to improve adhesion of photoresist on silicon substrate for...

Method to increase the lithographic process window of extreme ultra...

Method to improve adhesion of photoresist on silicon substrate for...

Adhesion of polymers on silicon substrates

Method to improve adhesion of photoresist on silicon substrate for...

Wet strippable gap fill materials

Patterning process using a boron phosphorus silicon glass film

Cleanability assessment of sublimate from lithography materials

Near-infrared absorbing film compositions

Wet strip process for an antireflective coating layer

Deep well implant using blocking mask

Block mask litho on high aspect ratio topography with minimal semic...

Acid-strippable silicon-containing antireflective coating

Dielectric tone inversion materials

Dielectric tone inversion materials

Near-infrared absorptive layer-forming composition and multilayer film

Silicon-containing antireflective coatings including non-polymeric...

Patterning contacts in carbon nanotube devices

Patterning contacts in carbon nanotube devices

Near-infrared absorbing film compositions

Patterning process

Near-infrared absorptive layer-forming composition and multilayer f...

Method to transfer lithographic patterns into inorganic substrates

Photoacid generators for extreme ultraviolet lithography

Near-infrared absorbing film compositions

Integration process to improve focus leveling within a lot process...

Near-infrared absorbing film compositions

Photoacid generators for extreme ultraviolet lithography

Patents Applicationslast 30 patents

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

ADHESION OF POLYMERS ON SILICON SUBSTRATES

METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

PATTERNING PROCESS

DIELECTRIC TONE INVERSION MATERIALS

BLOCK MASK LITHO ON HIGH ASPECT RATIO TOPOGRAPHY WITH MINIMAL SEMIC...

CLEANABILITY ASSESSMENT OF SUBLIMATE FROM LITHOGRAPHY MATERIALS

DEEP WELL IMPLANT USING BLOCKING MASK

WET STRIP PROCESS FOR AN ANTIREFLECTIVE COATING LAYER

SILICON-CONTAINING ANTIREFLECTIVE COATINGS INCLUDING NON-POLYMERIC...

NEAR-INFRARED ABSORBING FILM COMPOSITIONS

ACID-STRIPPABLE SILICON-CONTAINING ANTIREFLECTIVE COATING

NEAR-INFRARED ABSORBING FILM COMPOSITION FOR LITHOGRAPHIC APPLICATION

Patterning Contacts in Carbon Nanotube Devices

PATTERNING CONTACTS IN CARBON NANOTUBE DEVICES

Method to Transfer Lithographic Patterns Into Inorganic Substrates

Near-Infrared Absorbing Film Compositions

NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER F...

Novel Integration Process to Improve Focus Leveling Within a Lot Pr...

NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM

NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM

Photoacid Generators for Extreme Ultraviolet Lithography

Near-Infrared Absorbing Film Compositions

Near-Infrared Absorbing Film Compositions

IONIC, ORGANIC PHOTOACID GENERATORS FOR DUV, MUV AND OPTICAL LITHOG...

PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY