Martin HERMANN

Person

Heidenheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror element, in particular for a microlithographic projection ex...
- Patent number 10,598,921
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,310,382
- Issue date Jun 4, 2019
- Carl Zeiss SMT GmbH
- Martin Hermann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and arrangement for determining the heating condition of a m...
- Patent number 10,161,808
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Peter Vogt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEVICE FOR SETTING AN OPTICAL TRANSMISSION
- Publication number 20250158346
- Publication date May 15, 2025
- Carl Zeiss SMT GMBH
- Martin Hermann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL COMPONENT AND OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOG...
- Publication number 20230384687
- Publication date Nov 30, 2023
- Carl Zeiss SMT GMBH
- Jeffrey Erxmeyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...
- Publication number 20190035512
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Christian Grasse
- G02 - OPTICS
Information Patent Application
MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20180101002
- Publication date Apr 12, 2018
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...
- Publication number 20170176741
- Publication date Jun 22, 2017
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20160154317
- Publication date Jun 2, 2016
- Carl Zeiss SMT GMBH
- Martin HERMANN
- G02 - OPTICS
Information Patent Application
Method and arrangement for determining the heating condition of a m...
- Publication number 20130230073
- Publication date Sep 5, 2013
- Peter Vogt
- G02 - OPTICS

Martin HERMANN

Person

Patents Grantslast 30 patents

Method for treating a reflective optical element for the EUV wavele...

Mirror element, in particular for a microlithographic projection ex...

Mirror, in particular for a microlithographic projection exposure a...

Method and arrangement for determining the heating condition of a m...

Patents Applicationslast 30 patents

DEVICE FOR SETTING AN OPTICAL TRANSMISSION

OPTICAL COMPONENT AND OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOG...

METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...

MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...

MIRROR ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EX...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

Method and arrangement for determining the heating condition of a m...