Martin Jacobus Johan JAK

Person

's-Hertogenbosch, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,650,047
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Eye-safe laser-based lighting
- Patent number 11,549,651
- Issue date Jan 10, 2023
- SIGNIFY HOLDING B.V.
- Marcellinus Petrus Carolus Michael Krijn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 11,385,552
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to determine a patterning process parameter
- Patent number 11,300,883
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology recipe selection
- Patent number 11,106,142
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,009,343
- Issue date May 18, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,831,109
- Issue date Nov 10, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology in lithographic processes
- Patent number 10,656,533
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring, device manufacturing method, metrology apparat...
- Patent number 10,656,534
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Correction using stack difference
- Patent number 10,635,004
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- Aiqin Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining edge roughness parameters
- Patent number 10,634,490
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus
- Patent number 10,620,550
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G01 - MEASURING TESTING
Information Patent Grant
Focus control arrangement and method
- Patent number 10,551,308
- Issue date Feb 4, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G01 - MEASURING TESTING
Information Patent Grant
Metrology recipe selection
- Patent number 10,527,953
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,481,506
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Murat Bozkurt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,386,176
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,379,445
- Issue date Aug 13, 2019
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system, inspection apparatus including such an illumin...
- Patent number 10,338,401
- Issue date Jul 2, 2019
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring, device manufacturing method, metrology apparat...
- Patent number 10,310,389
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for predicting performance of a measurement m...
- Patent number 10,289,008
- Issue date May 14, 2019
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrates for use in such methods,...
- Patent number 10,162,272
- Issue date Dec 25, 2018
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,133,188
- Issue date Nov 20, 2018
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G02 - OPTICS
Information Patent Grant
Method, apparatus and substrates for lithographic metrology
- Patent number 10,042,268
- Issue date Aug 7, 2018
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a property of a target structure, inspection ap...
- Patent number 9,940,703
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Murat Bozkurt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 9,811,003
- Issue date Nov 7, 2017
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system, inspection apparatus including such an illumin...
- Patent number 9,753,296
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral purity filter
- Patent number 9,726,989
- Issue date Aug 8, 2017
- ASML Netherlands B.V.
- Wouter Anthon Soer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20210325174
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20210026256
- Publication date Jan 28, 2021
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY RECIPE SELECTION
- Publication number 20200218166
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20200050114
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Murat Bozkurt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...
- Publication number 20190285993
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20190265028
- Publication date Aug 29, 2019
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EYE-SAFE LASER-BASED LIGHTING
- Publication number 20190165543
- Publication date May 30, 2019
- SIGNIFY HOLDING B.V.
- MARCELLINUS PETRUS CAROLUS MICHAEL KRIJN
- F21 - LIGHTING
Information Patent Application
Method to Determine a Patterning Process Parameter
- Publication number 20190094703
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology in Lithographic Processes
- Publication number 20190079413
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20190072859
- Publication date Mar 7, 2019
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190064677
- Publication date Feb 28, 2019
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan Jak
- G02 - OPTICS
Information Patent Application
Determining Edge Roughness Parameters
- Publication number 20180364036
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20180321599
- Publication date Nov 8, 2018
- ASML NETHERLANDS B.V.
- Murat BOZKURT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Predicting Performance of a Measurement M...
- Publication number 20180203367
- Publication date Jul 19, 2018
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20180173112
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Illumination System, Inspection Apparatus Including Such an Illumin...
- Publication number 20180088347
- Publication date Mar 29, 2018
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G02 - OPTICS
Information Patent Application
METROLOGY RECIPE SELECTION
- Publication number 20180088470
- Publication date Mar 29, 2018
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Method of Measuring a Property of a Target Structure, Inspection Ap...
- Publication number 20170206649
- Publication date Jul 20, 2017
- ASML NETHERLANDS B.V.
- Murat BOZKURT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20170184977
- Publication date Jun 29, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
FOCUS CONTROL ARRANGEMENT AND METHOD
- Publication number 20170176328
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Substrate, Lithographic System and...
- Publication number 20170068173
- Publication date Mar 9, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATES FOR USE IN SUCH METHODS,...
- Publication number 20170052454
- Publication date Feb 23, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, Apparatus and Substrates for Lithographic Metrology
- Publication number 20160291481
- Publication date Oct 6, 2016
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Property of a Target Structure, Inspection Ap...
- Publication number 20160086324
- Publication date Mar 24, 2016
- ASML NETHERLANDS B.V.
- Murat BOZKURT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20160061589
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Illumination System, Inspection Apparatus Including Such an Illumin...
- Publication number 20160025992
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G02 - OPTICS

Martin Jacobus Johan JAK

Person

Patents Grantslast 30 patents

Metrology apparatus and method for determining a characteristic of...

Eye-safe laser-based lighting

Metrology method, target and substrate

Method of measuring a structure, inspection apparatus, lithographic...

Method to determine a patterning process parameter

Metrology method, target and substrate

Metrology recipe selection

Metrology apparatus and method for determining a characteristic of...

Method of measuring a structure, inspection apparatus, lithographic...

Metrology method, target and substrate

Metrology in lithographic processes

Method of measuring, device manufacturing method, metrology apparat...

Correction using stack difference

Determining edge roughness parameters

Metrology method and apparatus

Focus control arrangement and method

Metrology recipe selection

Method of measuring a structure, inspection apparatus, lithographic...

Metrology method, target and substrate

Metrology method, target and substrate

Illumination system, inspection apparatus including such an illumin...

Method of measuring, device manufacturing method, metrology apparat...

Methods and apparatus for predicting performance of a measurement m...

Metrology method and apparatus, substrates for use in such methods,...

Metrology method, target and substrate

Method, apparatus and substrates for lithographic metrology

Method of measuring a property of a target structure, inspection ap...

Metrology method and apparatus, substrate, lithographic system and...

Illumination system, inspection apparatus including such an illumin...

Spectral purity filter

Patents Applicationslast 30 patents

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY RECIPE SELECTION

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...

Metrology Apparatus and Method for Determining a Characteristic of...

EYE-SAFE LASER-BASED LIGHTING

Method to Determine a Patterning Process Parameter

Metrology in Lithographic Processes

METROLOGY METHOD AND APPARATUS

METROLOGY METHOD, TARGET AND SUBSTRATE

Determining Edge Roughness Parameters

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Methods and Apparatus for Predicting Performance of a Measurement M...

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Illumination System, Inspection Apparatus Including Such an Illumin...

METROLOGY RECIPE SELECTION

Method of Measuring a Property of a Target Structure, Inspection Ap...

METROLOGY METHOD, TARGET AND SUBSTRATE

FOCUS CONTROL ARRANGEMENT AND METHOD

Metrology Method and Apparatus, Substrate, Lithographic System and...

METROLOGY METHOD AND APPARATUS, SUBSTRATES FOR USE IN SUCH METHODS,...

Method, Apparatus and Substrates for Lithographic Metrology

Method of Measuring a Property of a Target Structure, Inspection Ap...

METROLOGY METHOD, TARGET AND SUBSTRATE

Illumination System, Inspection Apparatus Including Such an Illumin...