Martin Lowisch

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Oberkochen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method and lithography device with a mask reflecting light
- Patent number 8,268,518
- Issue date Sep 18, 2012
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Masks, lithography device and semiconductor component
- Patent number 7,914,955
- Issue date Mar 29, 2011
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Groupwise corrected objective
- Patent number 7,576,934
- Issue date Aug 18, 2009
- Carl Zeiss SMT AG
- Michael Schottner
- G02 - OPTICS
Information Patent Grant
Masks, lithography device and semiconductor component
- Patent number 7,572,556
- Issue date Aug 11, 2009
- Carl Zeiss SMT AG
- Hans-Jürgen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection objective
- Patent number 7,557,902
- Issue date Jul 7, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Device manufacturing method and computer program
- Patent number 7,042,550
- Issue date May 9, 2006
- ASML Netherlands B.V.
- Martin Lowisch
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Method and Lithography Device with a Mask Reflecting Light
- Publication number 20110229827
- Publication date Sep 22, 2011
- Carl Zeiss SMT GMBH
- Hans-Jürgen MANN
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASKS, LITHOGRAPHY DEVICE AND SEMICONDUCTOR COMPONENT
- Publication number 20090268189
- Publication date Oct 29, 2009
- Carl Zeiss SMT AG
- Hans-Juergen MANN
- B82 - NANO-TECHNOLOGY
Information Patent Application
Groupwise corrected objective
- Publication number 20070195317
- Publication date Aug 23, 2007
- Michael Schottner
- G02 - OPTICS
Information Patent Application
Masks, lithography device and semiconductor component
- Publication number 20070082272
- Publication date Apr 12, 2007
- Hans-Jürgen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
Euv projection lens with mirrors made from material with differing...
- Publication number 20070035814
- Publication date Feb 15, 2007
- Udo Dinger
- G02 - OPTICS
Information Patent Application
Device manufacturing method and computer program
- Publication number 20040137677
- Publication date Jul 15, 2004
- ASML NETHERLANDS B.V.
- Martin Lowisch
- B82 - NANO-TECHNOLOGY