Martin Schlott

Person

Offenbach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
NiW(X) sputtering target with improved structure
- Patent number 11,566,320
- Issue date Jan 31, 2023
- Materion Advanced Materials Germany GmbH
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silver alloy-based sputter target
- Patent number 11,125,708
- Issue date Sep 21, 2021
- MATERION ADVANCED MATERIALS GERMANY GMBH
- Martin Schlott
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Double-layer system comprising a partially absorbing layer, and met...
- Patent number 10,487,392
- Issue date Nov 26, 2019
- MATERION ADVANCED MATERIALS GERMANY GMBH
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target with optimized performance characteristics
- Patent number 9,960,022
- Issue date May 1, 2018
- MATERION ADVANCED MATERIALS GERMANY GMBH
- Carl Christoph Stahr
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tube-shaped sputtering target
- Patent number 9,334,564
- Issue date May 10, 2016
- Heraeus Deutschland GmbH & Co. KG
- Christoph Simons
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target having amorphous and microcrystalline portions an...
- Patent number 9,051,646
- Issue date Jun 9, 2015
- Heraeus Deutschland GmbH & Co. KG
- Andreas Herzog
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Planar or tubular sputtering target and method for the production t...
- Patent number 8,974,707
- Issue date Mar 10, 2015
- Heraeus Deutschland GmbH & Co. KG
- Martin Schlott
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Thin film transistor (TFT) having copper electrodes
- Patent number 8,581,248
- Issue date Nov 12, 2013
- Heraeus Materials Technology GmbH & Co. KG
- Sabine Schneider-Betz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt base alloy sputtering target with high magnetic field penetr...
- Patent number 6,372,104
- Issue date Apr 16, 2002
- Leybold Materials GmbH
- Martin Schlott
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Method of preparing indium oxide/tin oxide target for cathodic sput...
- Patent number 6,187,253
- Issue date Feb 13, 2001
- Leybold Material GmbH
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cobalt base alloy target for a magnetron cathode sputtering system
- Patent number 5,728,279
- Issue date Mar 17, 1998
- Leybold Materials GmbH
- Martin Schlott
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Process for the recycling of spent indium oxide-tin oxide sputterin...
- Patent number 5,660,599
- Issue date Aug 26, 1997
- Leybold Materials GmbH
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for the production of partially reduced indium oxide-tin ox...
- Patent number 5,531,948
- Issue date Jul 2, 1996
- Leybold Materials GmbH
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter target for cathodic atomization to produce transparent, con...
- Patent number 5,480,532
- Issue date Jan 2, 1996
- Leybold Materials
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CoZrTa(X) Sputtering Target with Improved Magnetic Properties
- Publication number 20240018645
- Publication date Jan 18, 2024
- Materion Advanced Materials Germany GmbH
- Uwe KONIETZKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHAPED PARTS HAVING UNIFORM MECHANICAL PROPERTIES, COMPRISING SOLID...
- Publication number 20220161312
- Publication date May 26, 2022
- Heraeus Amloy Technologies GmbH
- Moritz Stolpe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
NiW(X) Sputtering Target with Improved Structure
- Publication number 20210156023
- Publication date May 27, 2021
- Materion Advanced Materials Germany GmbH
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR PREPARING A TUBULAR ARTICLE
- Publication number 20210071293
- Publication date Mar 11, 2021
- Materion Advanced Materials Germany GmbH
- Christoph Simons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYLINDRICAL TITANIUM OXIDE SPUTTERING TARGET AND PROCESS FOR MANUFA...
- Publication number 20200002235
- Publication date Jan 2, 2020
- Materion Advanced Materials Germany GmbH
- Markus Schultheis
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
SILVER ALLOY-BASED SPUTTER TARGET
- Publication number 20180340904
- Publication date Nov 29, 2018
- Materion Advanced Materials Germany GmbH
- Martin Schlott
- G01 - MEASURING TESTING
Information Patent Application
DOUBLE-LAYER SYSTEM COMPRISING A PARTIALLY ABSORBING LAYER, AND MET...
- Publication number 20180223418
- Publication date Aug 9, 2018
- Heraeus Deutschland GmbH & Co. KG
- Martin SCHLOTT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR PREPARING A TUBULAR ARTICLE
- Publication number 20180105925
- Publication date Apr 19, 2018
- Materion Advanced Materials Germany GmbH
- Christoph Simons
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SILVER-ALLOY BASED SPUTTERING TARGET
- Publication number 20170166999
- Publication date Jun 15, 2017
- Heraeus Deutschland GmbH & Co. KG
- Martin Schlott
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
LIGHT-ABSORBING LAYER AND LAYER SYSTEM CONTAINING THE LAYER, METHOD...
- Publication number 20160070033
- Publication date Mar 10, 2016
- Heraeus Deutschland GmbH & Co. KG
- Martin SCHLOTT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET WITH OPTIMIZED PERFORMANCE CHARACTERISTICS
- Publication number 20150287577
- Publication date Oct 8, 2015
- Heraeus Deutschland GmbH & Co. KG
- Carl Christoph Stahr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANAR OR TUBULAR SPUTTERING TARGET AND METHOD FOR THE PRODUCTION T...
- Publication number 20130264200
- Publication date Oct 10, 2013
- HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
- Martin SCHLOTT
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
TUBE-SHAPED SPUTTERING TARGET
- Publication number 20120213917
- Publication date Aug 23, 2012
- HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
- Christoph SIMONS
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
THIN FILM TRANSISTOR (TFT) HAVING COPPER ELECTRODES
- Publication number 20120146018
- Publication date Jun 14, 2012
- HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
- Sabine Schneider-Betz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sputtering Target Having Amorphous and Microcrystalline Portions an...
- Publication number 20120085641
- Publication date Apr 12, 2012
- HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
- Andreas HERZOG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Powder-Fiber Adhesive
- Publication number 20100038240
- Publication date Feb 18, 2010
- W.C. Heraeus GmbH
- Christoph Simons
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TUBULAR TARGET HAVING A CONNECTING LAYER ARRANGED BETWEEN THE TARGE...
- Publication number 20090250337
- Publication date Oct 8, 2009
- W.C. Heraeus GmbH
- Christoph Simons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputter Target With High-Melting Phase
- Publication number 20070240981
- Publication date Oct 18, 2007
- W.C. Heraeus GmbH
- Martin SCHLOTT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tubular sputtering target
- Publication number 20060151320
- Publication date Jul 13, 2006
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metal or metal alloy based sputter target and method for the produc...
- Publication number 20030168333
- Publication date Sep 11, 2003
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Martin Schlott

Person

Patents Grantslast 30 patents

NiW(X) sputtering target with improved structure

Silver alloy-based sputter target

Double-layer system comprising a partially absorbing layer, and met...

Sputtering target with optimized performance characteristics

Tube-shaped sputtering target

Sputtering target having amorphous and microcrystalline portions an...

Planar or tubular sputtering target and method for the production t...

Thin film transistor (TFT) having copper electrodes

Cobalt base alloy sputtering target with high magnetic field penetr...

Method of preparing indium oxide/tin oxide target for cathodic sput...

Cobalt base alloy target for a magnetron cathode sputtering system

Process for the recycling of spent indium oxide-tin oxide sputterin...

Process for the production of partially reduced indium oxide-tin ox...

Sputter target for cathodic atomization to produce transparent, con...

Patents Applicationslast 30 patents

CoZrTa(X) Sputtering Target with Improved Magnetic Properties

SHAPED PARTS HAVING UNIFORM MECHANICAL PROPERTIES, COMPRISING SOLID...

NiW(X) Sputtering Target with Improved Structure

PROCESS FOR PREPARING A TUBULAR ARTICLE

CYLINDRICAL TITANIUM OXIDE SPUTTERING TARGET AND PROCESS FOR MANUFA...

SILVER ALLOY-BASED SPUTTER TARGET

DOUBLE-LAYER SYSTEM COMPRISING A PARTIALLY ABSORBING LAYER, AND MET...

PROCESS FOR PREPARING A TUBULAR ARTICLE

SILVER-ALLOY BASED SPUTTERING TARGET

LIGHT-ABSORBING LAYER AND LAYER SYSTEM CONTAINING THE LAYER, METHOD...

SPUTTERING TARGET WITH OPTIMIZED PERFORMANCE CHARACTERISTICS

PLANAR OR TUBULAR SPUTTERING TARGET AND METHOD FOR THE PRODUCTION T...

TUBE-SHAPED SPUTTERING TARGET

THIN FILM TRANSISTOR (TFT) HAVING COPPER ELECTRODES

Sputtering Target Having Amorphous and Microcrystalline Portions an...

Powder-Fiber Adhesive

TUBULAR TARGET HAVING A CONNECTING LAYER ARRANGED BETWEEN THE TARGE...

Sputter Target With High-Melting Phase

Tubular sputtering target

Metal or metal alloy based sputter target and method for the produc...