Martin Sczyrba

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Particle beam writing method, particle beam writing apparatus and m...
- Patent number 8,257,888
- Issue date Sep 4, 2012
- Advanced Mask Technology Center GmbH + Co. KG
- Martin Sczyrba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for determining an exposure dose and exposure apparatus
- Patent number 7,811,727
- Issue date Oct 12, 2010
- Advanced Mask Technology Center GmbH & Co. KG
- Martin Sczyrba
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Particle Beam Writing Method, Particle Beam Writing Apparatus and M...
- Publication number 20100104961
- Publication date Apr 29, 2010
- Advanced Mask Technology Center GmbH Co. KG
- Martin Sczyrba
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system and a photolithography apparatus employing the...
- Publication number 20070263192
- Publication date Nov 15, 2007
- Advanced Mask Technology Center GmbH & Co. KG
- Karsten Bubke
- G02 - OPTICS
Information Patent Application
Method for determining an exposure dose and exposure apparatus
- Publication number 20070117032
- Publication date May 24, 2007
- Advantage Mask Technology Center GmbH & Co. KG
- Martin Sczyrba
- B82 - NANO-TECHNOLOGY