Martin Weigert

Person

Hanau, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Sputter target based on titanium dioxide
- Patent number 7,431,808
- Issue date Oct 7, 2008
- W.C. Heraeus GmbH & Co., KG
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target for depositing silicon layers in their nitride or...
- Patent number 6,581,669
- Issue date Jun 24, 2003
- W.C. Heraeus GmbH & Co., KG
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cobalt base alloy target for a magnetron cathode sputtering system
- Patent number 5,728,279
- Issue date Mar 17, 1998
- Leybold Materials GmbH
- Martin Schlott
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Process for the production of partially reduced indium oxide-tin ox...
- Patent number 5,531,948
- Issue date Jul 2, 1996
- Leybold Materials GmbH
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target for cathode sputtering and method of its production
- Patent number 5,480,531
- Issue date Jan 2, 1996
- Degussa Aktiengesellschaft
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter target for cathodic atomization to produce transparent, con...
- Patent number 5,480,532
- Issue date Jan 2, 1996
- Leybold Materials
- Martin Schlott
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for coating a substrate of low resistance to corrosion
- Patent number 5,407,548
- Issue date Apr 18, 1995
- Leybold Aktiengesellschaft
- Uwe Kopacz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target for magnetron-sputtering systems
- Patent number 5,112,468
- Issue date May 12, 1992
- Degussa AG
- Martin Weigert
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
COLD-PRESSED SPUTTER TARGETS
- Publication number 20090277777
- Publication date Nov 12, 2009
- W.C. Heraeus GmbH
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUBULAR TARGET HAVING A CONNECTING LAYER ARRANGED BETWEEN THE TARGE...
- Publication number 20090250337
- Publication date Oct 8, 2009
- W.C. Heraeus GmbH
- Christoph Simons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputter Target Having a Sputter Material Based on TiO2 and Producti...
- Publication number 20090183987
- Publication date Jul 23, 2009
- W.C. Heraeus GmbH
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MATERIAL MIXTURE, SPUTTER TARGET AND METHOD FOR PRODUCING A SPUTTER...
- Publication number 20080187453
- Publication date Aug 7, 2008
- W.C. Heraeus GmbH
- Markus SCHULTHEIS
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTER TARGET OF A SILVER ALLOY, ITS USE AND GLASS SUBSTRATE WITH...
- Publication number 20070259191
- Publication date Nov 8, 2007
- W.C. Heraeus GmbH
- Christoph SIMONS
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Processes for producing a sputtering target from a silicon-based al...
- Publication number 20060207740
- Publication date Sep 21, 2006
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tubular sputtering target
- Publication number 20060151320
- Publication date Jul 13, 2006
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processes for producing a sputtering target from a silicon-based al...
- Publication number 20050092455
- Publication date May 5, 2005
- W.C. Heraeus, GmbH & Co. KG
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processes for producing a sputtering target from a silicon-based al...
- Publication number 20040094283
- Publication date May 20, 2004
- W.C. Heraeus GmbH & Co.KG
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering target for depositing silicon layers in their nitride or...
- Publication number 20030183508
- Publication date Oct 2, 2003
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputter target made of a silicon alloy and process for producing a...
- Publication number 20030103857
- Publication date Jun 5, 2003
- W.C. Heraeus GmbH & Co.KG
- Josef Heindel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputter target based on titanium dioxide
- Publication number 20030038028
- Publication date Feb 27, 2003
- W.C. Heraeus GmbH & Co.KG
- Markus Schultheis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering target for depositing silicon layers in their nitride or...
- Publication number 20020008021
- Publication date Jan 24, 2002
- Martin Weigert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Martin Weigert

Person

Patents Grantslast 30 patents

Sputter target based on titanium dioxide

Sputtering target for depositing silicon layers in their nitride or...

Cobalt base alloy target for a magnetron cathode sputtering system

Process for the production of partially reduced indium oxide-tin ox...

Target for cathode sputtering and method of its production

Sputter target for cathodic atomization to produce transparent, con...

Method for coating a substrate of low resistance to corrosion

Target for magnetron-sputtering systems

Patents Applicationslast 30 patents

COLD-PRESSED SPUTTER TARGETS

TUBULAR TARGET HAVING A CONNECTING LAYER ARRANGED BETWEEN THE TARGE...

Sputter Target Having a Sputter Material Based on TiO2 and Producti...

MATERIAL MIXTURE, SPUTTER TARGET AND METHOD FOR PRODUCING A SPUTTER...

SPUTTER TARGET OF A SILVER ALLOY, ITS USE AND GLASS SUBSTRATE WITH...

Processes for producing a sputtering target from a silicon-based al...

Tubular sputtering target

Processes for producing a sputtering target from a silicon-based al...

Processes for producing a sputtering target from a silicon-based al...

Sputtering target for depositing silicon layers in their nitride or...

Sputter target made of a silicon alloy and process for producing a...

Sputter target based on titanium dioxide

Sputtering target for depositing silicon layers in their nitride or...