Martin WEISER

Person

Sinsheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Device for changing a surface shape of an optical element via elect...
- Patent number 10,551,747
- Issue date Feb 4, 2020
- Carl Zeiss SMT GmbH
- Walter Pauls
- G02 - OPTICS
Information Patent Grant
Wavefront correction element for use in an optical system
- Patent number 10,151,922
- Issue date Dec 11, 2018
- Carl Zeiss SMT GmbH
- Matus Banyay
- G02 - OPTICS
Information Patent Grant
Substrate for mirrors for EUV lithography
- Patent number 8,976,927
- Issue date Mar 10, 2015
- Carl Zeiss SMT GmbH
- Claudia Ekstein
- G02 - OPTICS
Information Patent Grant
Irradiation with high energy ions for surface structuring and treat...
- Patent number 8,466,047
- Issue date Jun 18, 2013
- Carl Zeiss SMT GmbH
- Martin Weiser
- G02 - OPTICS
Information Patent Grant
Irradiation with high energy ions for surface structuring and treat...
- Patent number 8,163,632
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Martin Weiser
- G02 - OPTICS
Information Patent Grant
Removing reflective layers from EUV mirrors
- Patent number 7,919,004
- Issue date Apr 5, 2011
- Carl Zeiss SMT GmbH
- Martin Weiser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mirror for use in a projection exposure apparatus
- Patent number 7,481,543
- Issue date Jan 27, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing an optical element
- Patent number 7,118,449
- Issue date Oct 10, 2006
- Carl Zeiss SMT AG
- Udo Dinger
- B24 - GRINDING POLISHING
Information Patent Grant
Reflecting device for electromagnetic waves
- Patent number 7,077,533
- Issue date Jul 18, 2006
- Carl Zeiss SMT AG
- Martin Weiser
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Substrate material for X-ray optical components
- Patent number 7,031,428
- Issue date Apr 18, 2006
- Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Catadioptric objective
- Patent number 6,842,294
- Issue date Jan 11, 2005
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
DEVICE FOR CHANGING A SURFACE SHAPE OF AN OPTICAL ELEMENT VIA ELECT...
- Publication number 20190018324
- Publication date Jan 17, 2019
- Carl Zeiss SMT GMBH
- Walter Pauls
- G02 - OPTICS
Information Patent Application
WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM
- Publication number 20180059413
- Publication date Mar 1, 2018
- Carl Zeiss SMT GMBH
- Matus BANYAY
- G02 - OPTICS
Information Patent Application
Reflective Optical Element for the EUV Wavelength Range, Method for...
- Publication number 20140307308
- Publication date Oct 16, 2014
- Carl Zeiss SMT GMBH
- Markus WEISS
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY
- Publication number 20130170056
- Publication date Jul 4, 2013
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- G02 - OPTICS
Information Patent Application
SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PR...
- Publication number 20120212721
- Publication date Aug 23, 2012
- Carl Zeiss SMT GMBH
- Wilfried CLAUSS
- G02 - OPTICS
Information Patent Application
IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...
- Publication number 20120206795
- Publication date Aug 16, 2012
- Martin WEISER
- G02 - OPTICS
Information Patent Application
REMOVING REFLECTIVE LAYERS FROM EUV MIRRORS
- Publication number 20100027106
- Publication date Feb 4, 2010
- Carl Zeiss SMT AG
- Martin WEISER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...
- Publication number 20080149858
- Publication date Jun 26, 2008
- Carl Zeiss SMT AG
- Martin Weiser
- G02 - OPTICS
Information Patent Application
Substrate material for X-ray optical components
- Publication number 20040202278
- Publication date Oct 14, 2004
- Carl-Zeiss Stiftung Trading as Schott-Glas and Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Reflecting device for electromagnetic waves
- Publication number 20040174624
- Publication date Sep 9, 2004
- Martin Weiser
- B82 - NANO-TECHNOLOGY
Information Patent Application
Catadioptric objective
- Publication number 20020181125
- Publication date Dec 5, 2002
- Hubert Holderer
- G02 - OPTICS

Martin WEISER

Person

Patents Grantslast 30 patents

Device for changing a surface shape of an optical element via elect...

Wavefront correction element for use in an optical system

Substrate for mirrors for EUV lithography

Irradiation with high energy ions for surface structuring and treat...

Irradiation with high energy ions for surface structuring and treat...

Removing reflective layers from EUV mirrors

Mirror for use in a projection exposure apparatus

Method of manufacturing an optical element

Reflecting device for electromagnetic waves

Substrate material for X-ray optical components

Catadioptric objective

Patents Applicationslast 30 patents

DEVICE FOR CHANGING A SURFACE SHAPE OF AN OPTICAL ELEMENT VIA ELECT...

WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM

Reflective Optical Element for the EUV Wavelength Range, Method for...

SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY

SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PR...

IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...

REMOVING REFLECTIVE LAYERS FROM EUV MIRRORS

IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...

Substrate material for X-ray optical components

Reflecting device for electromagnetic waves

Catadioptric objective