Marty W. Degroot

Person

Midland, MI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of making chemical mechanical polishing layers having impro...
- Patent number 11,524,390
- Issue date Dec 13, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 11,396,081
- Issue date Jul 26, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 10,875,144
- Issue date Dec 29, 2020
- Rohm and Haas Electronic Materials CMP Holdings, I
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
High removal rate chemical mechanical polishing pads and methods of...
- Patent number 10,722,999
- Issue date Jul 28, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Thomas P. Willumstad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High removal rate chemical mechanical polishing pads from amine ini...
- Patent number 10,464,187
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,144,115
- Issue date Dec 4, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,105,825
- Issue date Oct 23, 2018
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled-porosity method for forming polishing pad
- Patent number 10,005,172
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,776,300
- Issue date Oct 3, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Polyurethane polishing pad
- Patent number 9,731,398
- Issue date Aug 15, 2017
- Rohm and Haas Electronic Materials CMP Holding, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,586,305
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method
- Patent number 9,484,212
- Issue date Nov 1, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Broad spectrum, endpoint detection monophase olefin copolymer windo...
- Patent number 9,446,497
- Issue date Sep 20, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Angus Repper
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with clear endpoint detection window
- Patent number 9,333,620
- Issue date May 10, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with endpoint detection window
- Patent number 9,314,897
- Issue date Apr 19, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with polishing layer and window
- Patent number 9,259,820
- Issue date Feb 16, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing layer formulation with conditioning t...
- Patent number 9,259,821
- Issue date Feb 16, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical window polishing pad
- Patent number 9,238,295
- Issue date Jan 19, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Multilayer chemical mechanical polishing pad stack with soft and co...
- Patent number 9,238,296
- Issue date Jan 19, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- James Murnane
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad stack
- Patent number 9,233,451
- Issue date Jan 12, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- James Murnane
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with endpoint detection window
- Patent number 9,216,489
- Issue date Dec 22, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Thin film solar cell processing and testing method and equipment
- Patent number 9,153,503
- Issue date Oct 6, 2015
- Dow Global Technologies LLC
- Marty W. Degroot
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Photovoltaic cell assembly
- Patent number 9,147,788
- Issue date Sep 29, 2015
- Dow Global Technologies LLC
- Marty DeGroot
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad
- Patent number 9,144,880
- Issue date Sep 29, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Multilayer chemical mechanical polishing pad
- Patent number 9,108,290
- Issue date Aug 18, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Angus Repper
- B24 - GRINDING POLISHING
Information Patent Grant
Method of chemical mechanical polishing a substrate
- Patent number 9,102,034
- Issue date Aug 11, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad with window
- Patent number 9,064,806
- Issue date Jun 23, 2015
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Automated assembly method for the production of interconnected thin...
- Patent number 9,065,008
- Issue date Jun 23, 2015
- Dow Global Technologies LLC
- Marty W. Degroot
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Moisture resistant photovoltaic devices with improved adhesion of b...
- Patent number 9,059,349
- Issue date Jun 16, 2015
- Dow Global Technologies LLC
- Marty W. DeGroot
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Methodology for forming pnictide compositions suitable for use in m...
- Patent number 9,034,685
- Issue date May 19, 2015
- Dow Global Technologies LLC
- Gregory M. Kimball
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20220266416
- Publication date Aug 25, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20190308294
- Publication date Oct 10, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS FROM AMINE INI...
- Publication number 20190168356
- Publication date Jun 6, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20180361531
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MAKING CHEMICAL MECHANICAL POLISHING LAYERS HAVING IMPRO...
- Publication number 20180311792
- Publication date Nov 1, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20180281149
- Publication date Oct 4, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS AND METHODS OF...
- Publication number 20170361421
- Publication date Dec 21, 2017
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Thomas P. Willumstad
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160379840
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160375543
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD
- Publication number 20160375550
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375553
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375555
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING PHOTOVOLTAIC DEVICES WITH REDUCED CONDUCTION BAND...
- Publication number 20160071994
- Publication date Mar 10, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Jeffrey P. Bosco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYURETHANE POLISHING PAD
- Publication number 20160052103
- Publication date Feb 25, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20150375361
- Publication date Dec 31, 2015
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING LAYER FORMULATION WITH CONDITIONING T...
- Publication number 20150375362
- Publication date Dec 31, 2015
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH CLEAR ENDPOINT DETECTION WINDOW
- Publication number 20150306730
- Publication date Oct 29, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20150306731
- Publication date Oct 29, 2015
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH ENDPOINT DETECTION WINDOW
- Publication number 20150306729
- Publication date Oct 29, 2015
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH ENDPOINT DETECTION WINDOW
- Publication number 20150273651
- Publication date Oct 1, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Bainian Qian
- G02 - OPTICS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH POLISHING LAYER AND WINDOW
- Publication number 20150273652
- Publication date Oct 1, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Bainian Qian
- G02 - OPTICS
Information Patent Application
PHOTOVOLTAIC DEVICES INCORPORATING THIN CHALCOGENIDE FILM ELECTRIC...
- Publication number 20150255637
- Publication date Sep 10, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Jeffrey P. Bosco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOISTURE RESISTANT PHOTOVOLTAIC DEVICES WITH EXPOSED CONDUCTIVE GRID
- Publication number 20150107666
- Publication date Apr 23, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Paul R. Elowe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH UTILIZATION PHOTO-VOLTAIC DEVICE
- Publication number 20150107653
- Publication date Apr 23, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Abhijit Namjoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYURETHANE POLISHING PAD
- Publication number 20150059254
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Fengji Yeh
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20150065013
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE
- Publication number 20150065014
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF FORMING A PHOTOVOLTAIC CELL
- Publication number 20150000720
- Publication date Jan 1, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Marty DeGroot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING PHOTOVOLTAIC DEVICES INCORPORATING IMPROVED PNICTI...
- Publication number 20140360566
- Publication date Dec 11, 2014
- Gregory M. Kimball
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multilayer Chemical Mechanical Polishing Pad Stack With Soft And Co...
- Publication number 20140357163
- Publication date Dec 4, 2014
- James Murnane
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Marty W. Degroot

Person

Patents Grantslast 30 patents

Methods of making chemical mechanical polishing layers having impro...

Chemical mechanical polishing pad

Chemical mechanical polishing pad

High removal rate chemical mechanical polishing pads and methods of...

High removal rate chemical mechanical polishing pads from amine ini...

Method of making polishing layer for chemical mechanical polishing pad

Method of making polishing layer for chemical mechanical polishing pad

Controlled-porosity method for forming polishing pad

Chemical mechanical polishing pad and method of making same

Polyurethane polishing pad

Chemical mechanical polishing pad and method of making same

Chemical mechanical polishing method

Broad spectrum, endpoint detection monophase olefin copolymer windo...

Chemical mechanical polishing pad with clear endpoint detection window

Chemical mechanical polishing pad with endpoint detection window

Chemical mechanical polishing pad with polishing layer and window

Chemical mechanical polishing layer formulation with conditioning t...

Soft and conditionable chemical mechanical window polishing pad

Multilayer chemical mechanical polishing pad stack with soft and co...

Soft and conditionable chemical mechanical polishing pad stack

Chemical mechanical polishing pad with endpoint detection window

Thin film solar cell processing and testing method and equipment

Photovoltaic cell assembly

Soft and conditionable chemical mechanical polishing pad

Multilayer chemical mechanical polishing pad

Method of chemical mechanical polishing a substrate

Soft and conditionable chemical mechanical polishing pad with window

Automated assembly method for the production of interconnected thin...

Moisture resistant photovoltaic devices with improved adhesion of b...

Methodology for forming pnictide compositions suitable for use in m...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING PAD

CHEMICAL MECHANICAL POLISHING PAD

HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS FROM AMINE INI...

CHEMICAL MECHANICAL POLISHING PAD

METHODS OF MAKING CHEMICAL MECHANICAL POLISHING LAYERS HAVING IMPRO...

CHEMICAL MECHANICAL POLISHING PAD

HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS AND METHODS OF...

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

METHOD OF MAKING PHOTOVOLTAIC DEVICES WITH REDUCED CONDUCTION BAND...

POLYURETHANE POLISHING PAD

CHEMICAL MECHANICAL POLISHING METHOD

CHEMICAL MECHANICAL POLISHING LAYER FORMULATION WITH CONDITIONING T...

CHEMICAL MECHANICAL POLISHING PAD WITH CLEAR ENDPOINT DETECTION WINDOW

CHEMICAL MECHANICAL POLISHING PAD

CHEMICAL MECHANICAL POLISHING PAD WITH ENDPOINT DETECTION WINDOW

CHEMICAL MECHANICAL POLISHING PAD WITH ENDPOINT DETECTION WINDOW

CHEMICAL MECHANICAL POLISHING PAD WITH POLISHING LAYER AND WINDOW

PHOTOVOLTAIC DEVICES INCORPORATING THIN CHALCOGENIDE FILM ELECTRIC...

MOISTURE RESISTANT PHOTOVOLTAIC DEVICES WITH EXPOSED CONDUCTIVE GRID

HIGH UTILIZATION PHOTO-VOLTAIC DEVICE

POLYURETHANE POLISHING PAD

CHEMICAL MECHANICAL POLISHING PAD

METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE

METHOD OF FORMING A PHOTOVOLTAIC CELL

METHOD OF MAKING PHOTOVOLTAIC DEVICES INCORPORATING IMPROVED PNICTI...

Multilayer Chemical Mechanical Polishing Pad Stack With Soft And Co...