Mary Jo Kulp

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-functional polishing pad
- Patent number 8,697,239
- Issue date Apr 15, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Creep-resistant polishing pad window
- Patent number 8,697,217
- Issue date Apr 15, 2014
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Adam Loyack
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad having a low defect window
- Patent number 8,431,489
- Issue date Apr 30, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Polyurethane polishing pad
- Patent number 8,288,448
- Issue date Oct 16, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with light stable polymeric endpo...
- Patent number 8,257,545
- Issue date Sep 4, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Adam Loyack
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad having a low defect integral window
- Patent number 8,257,544
- Issue date Sep 4, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad having integral identification fe...
- Patent number 8,118,644
- Issue date Feb 21, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad having window with integral ident...
- Patent number 8,118,641
- Issue date Feb 21, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,569,268
- Issue date Aug 4, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,445,847
- Issue date Nov 4, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,438,636
- Issue date Oct 21, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming a porous polishing pad
- Patent number 7,435,364
- Issue date Oct 14, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polyurethane polishing pad
- Patent number 7,414,080
- Issue date Aug 19, 2008
- Materials CMP Holdings, Inc.
- Mary Jo Kulp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Elastomer-modified chemical mechanical polishing pad
- Patent number 7,371,160
- Issue date May 13, 2008
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Carlos A. Cruz
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,169,030
- Issue date Jan 30, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 7,074,115
- Issue date Jul 11, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POLYURETHANE POLISHING PAD
- Publication number 20150059254
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Fengji Yeh
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad having a low defect window
- Publication number 20120295442
- Publication date Nov 22, 2012
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Polishing Pad With Light Stable Polymeric Endpo...
- Publication number 20120077418
- Publication date Mar 29, 2012
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Adam Loyack
- B24 - GRINDING POLISHING
Information Patent Application
Creep-resistant polishing pad window
- Publication number 20110177758
- Publication date Jul 21, 2011
- Adam Loyack
- B24 - GRINDING POLISHING
Information Patent Application
Polyurethane polishing pad
- Publication number 20110054057
- Publication date Mar 3, 2011
- Mary Jo Kulp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Multi-functional polishing pad
- Publication number 20110021123
- Publication date Jan 27, 2011
- Mary Jo Kulp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical mechanical polishing pad having a low defect integral window
- Publication number 20100317261
- Publication date Dec 16, 2010
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Polishing Pad Having Window With Integral Ident...
- Publication number 20100227533
- Publication date Sep 9, 2010
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad having integral identification fe...
- Publication number 20100099336
- Publication date Apr 22, 2010
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20100035529
- Publication date Feb 11, 2010
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad having electrospun polishing layer
- Publication number 20100015895
- Publication date Jan 21, 2010
- Jeffrey J. Hendron
- B24 - GRINDING POLISHING
Information Patent Application
Polyurethane polishing pad
- Publication number 20080242755
- Publication date Oct 2, 2008
- Mary Jo Kulp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20080182492
- Publication date Jul 31, 2008
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20080153395
- Publication date Jun 26, 2008
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20070275226
- Publication date Nov 29, 2007
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Method for forming a porous polishing pad
- Publication number 20060226567
- Publication date Oct 12, 2006
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polyurethane polishing pad
- Publication number 20050171225
- Publication date Aug 4, 2005
- Mary Jo Kulp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polyurethane polishing pad
- Publication number 20050171224
- Publication date Aug 4, 2005
- Mary Jo Kulp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polishing pad
- Publication number 20050079806
- Publication date Apr 14, 2005
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Mary Jo Kulp

Person

Patents Grantslast 30 patents

Multi-functional polishing pad

Creep-resistant polishing pad window

Chemical mechanical polishing pad having a low defect window

Polyurethane polishing pad

Chemical mechanical polishing pad with light stable polymeric endpo...

Chemical mechanical polishing pad having a low defect integral window

Chemical mechanical polishing pad having integral identification fe...

Chemical mechanical polishing pad having window with integral ident...

Chemical mechanical polishing pad

Chemical mechanical polishing pad

Chemical mechanical polishing pad

Method for forming a porous polishing pad

Polyurethane polishing pad

Elastomer-modified chemical mechanical polishing pad

Chemical mechanical polishing pad

Polishing pad

Patents Applicationslast 30 patents

POLYURETHANE POLISHING PAD

Chemical mechanical polishing pad having a low defect window

Chemical Mechanical Polishing Pad With Light Stable Polymeric Endpo...

Creep-resistant polishing pad window

Polyurethane polishing pad

Multi-functional polishing pad

Chemical mechanical polishing pad having a low defect integral window

Chemical Mechanical Polishing Pad Having Window With Integral Ident...

Chemical mechanical polishing pad having integral identification fe...

Chemical mechanical polishing pad

Chemical mechanical polishing pad having electrospun polishing layer

Polyurethane polishing pad

Chemical mechanical polishing pad

Chemical mechanical polishing pad

Chemical mechanical polishing pad

Method for forming a porous polishing pad

Polyurethane polishing pad

Polyurethane polishing pad

Polishing pad