Masaaki Hagiwara

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Beverly, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for removing photoresist and etch residues
- Patent number 7,169,440
- Issue date Jan 30, 2007
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing photoresist and etch residues
- Patent number 6,849,559
- Issue date Feb 1, 2005
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for removing photoresist and etch residues
- Publication number 20030192856
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for removing photoresist and etch residues
- Publication number 20030194876
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY