Masaaki HANAMURA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive composition, cured film and production process there...
- Patent number 9,541,827
- Issue date Jan 10, 2017
- JSR Corporation
- Tomohiko Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type radiation-sensitive composition, cured film, interlay...
- Patent number 8,486,604
- Issue date Jul 16, 2013
- JSR Corporation
- Masaaki Hanamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming pattern, and optical element
- Patent number 7,378,224
- Issue date May 27, 2008
- JSR Corporation
- Masaaki Hanamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition, microlens, process for forming mic...
- Patent number 7,374,799
- Issue date May 20, 2008
- JSR Corporation
- Masaaki Hanamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation sensitive refractive index changing composition, pattern...
- Patent number 7,320,854
- Issue date Jan 22, 2008
- JSR Corporation
- Masaaki Hanamura
- G02 - OPTICS
Information Patent Grant
Composition and method for temporarily fixing solid
- Patent number 7,186,448
- Issue date Mar 6, 2007
- JSR Corporation
- Yasuaki Yokoyama
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THERE...
- Publication number 20140234777
- Publication date Aug 21, 2014
- JSR Corporation
- Tomohiko SAKURAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION, POLYMER, CURED FILM AND ELECTRONIC PART
- Publication number 20130012618
- Publication date Jan 10, 2013
- JSR Corporation
- Akito HIRO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION, CURED FILM AND ELECTRONIC PART
- Publication number 20120296053
- Publication date Nov 22, 2012
- JSR Corporation
- Masaaki HANAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAY...
- Publication number 20110008730
- Publication date Jan 13, 2011
- JSR Corporation
- Masaaki HANAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE...
- Publication number 20080213692
- Publication date Sep 4, 2008
- JSR Corporation
- Masaaki Hanamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition and method for temporarily fixing solids
- Publication number 20060275939
- Publication date Dec 7, 2006
- JSR Corporation
- Yasuaki Yokoyama
- B24 - GRINDING POLISHING
Information Patent Application
Radiation sensitive resin composition for forming microlens
- Publication number 20060008735
- Publication date Jan 12, 2006
- JSR Corporation
- Masaaki Hanamura
- G02 - OPTICS
Information Patent Application
Radiation sensitive composition, microlens, process for forming mic...
- Publication number 20050157399
- Publication date Jul 21, 2005
- JSR Corporation
- Masaaki Hanamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern, and optical element
- Publication number 20050014100
- Publication date Jan 20, 2005
- JSR Corporation
- Masaaki Hanamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation sensitive refractive index changing composition, pattern...
- Publication number 20040265737
- Publication date Dec 30, 2004
- JSR Corporation
- Masaaki Hanamura
- G02 - OPTICS
Information Patent Application
Composition and method for temporarily fixing solid
- Publication number 20040185187
- Publication date Sep 23, 2004
- Yasuaki Yokoyama
- B24 - GRINDING POLISHING

Masaaki HANAMURA

Person

Patents Grantslast 30 patents

Photosensitive composition, cured film and production process there...

Positive-type radiation-sensitive composition, cured film, interlay...

Method for forming pattern, and optical element

Radiation sensitive composition, microlens, process for forming mic...

Radiation sensitive refractive index changing composition, pattern...

Composition and method for temporarily fixing solid

Patents Applicationslast 30 patents

PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THERE...

RESIN COMPOSITION, POLYMER, CURED FILM AND ELECTRONIC PART

PHOTOSENSITIVE COMPOSITION, CURED FILM AND ELECTRONIC PART

POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAY...

RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE...

Composition and method for temporarily fixing solids

Radiation sensitive resin composition for forming microlens

Radiation sensitive composition, microlens, process for forming mic...

Method for forming pattern, and optical element

Radiation sensitive refractive index changing composition, pattern...

Composition and method for temporarily fixing solid