Masaaki Hasei

Person

Tsukui-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Single-substrate-heat-treating apparatus for semiconductor process...
- Patent number 6,399,922
- Issue date Jun 4, 2002
- Tokyo Electron Limited
- Wataru Okase
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single-substrate-heat-treating apparatus for semiconductor process...
- Patent number 6,228,173
- Issue date May 8, 2001
- Tokyo Electron Limited
- Wataru Okase
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ozone-processing apparatus for semiconductor process system
- Patent number 6,224,934
- Issue date May 1, 2001
- Tokyo Electron Limited
- Masaaki Hasei
- C30 - CRYSTAL GROWTH
Information Patent Grant
Wafer processing apparatus with a processing vessel, upper and lowe...
- Patent number 6,111,225
- Issue date Aug 29, 2000
- Tokyo Electron Limited
- Wataru Ohkase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment processing apparatus and cleaning method thereof
- Patent number 5,554,226
- Issue date Sep 10, 1996
- Tokyo Electron Kabushiki Kaisha
- Wataru Okase
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning heat treatment processing apparatus
- Patent number 5,427,625
- Issue date Jun 27, 1995
- Tokyo Electron Kabushiki Kaisha
- Wataru Okase
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Single-substrate-heat-treating apparatus for semiconductor process...
- Publication number 20010012604
- Publication date Aug 9, 2001
- TOKYO ELECTRON LIMITED
- Wataru Okase
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masaaki Hasei

Person

Patents Grantslast 30 patents

Single-substrate-heat-treating apparatus for semiconductor process...

Single-substrate-heat-treating apparatus for semiconductor process...

Ozone-processing apparatus for semiconductor process system

Wafer processing apparatus with a processing vessel, upper and lowe...

Heat treatment processing apparatus and cleaning method thereof

Method for cleaning heat treatment processing apparatus

Patents Applicationslast 30 patents

Single-substrate-heat-treating apparatus for semiconductor process...