Masaaki Miyajima

Person

Kasugai, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Preparing data for hybrid exposure using both electron beam exposur...
- Patent number 8,141,009
- Issue date Mar 20, 2012
- Fujitsu Semiconductor Limited
- Masaaki Miyajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable rectangle-type electron beam exposure apparatus and patter...
- Patent number 7,205,557
- Issue date Apr 17, 2007
- Fujitsu Limited
- Masaaki Miyajima
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and apparatus for generating semiconductor exposure data
- Patent number 6,275,604
- Issue date Aug 14, 2001
- Fujitsu Limited
- Masaaki Miyajima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for generating exposure data of semiconductor...
- Patent number 5,995,878
- Issue date Nov 30, 1999
- Fujitsu Limited
- Masaaki Miyajima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Block exposure of semiconductor wafer
- Patent number 5,984,505
- Issue date Nov 16, 1999
- Fujitsu Limited
- Masaaki Miyajima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Block exposure of semiconductor wafer
- Patent number 5,917,579
- Issue date Jun 29, 1999
- Fujitsu Limited
- Masaaki Miyajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern judging method, mask producing method, and method of dividi...
- Patent number 5,537,487
- Issue date Jul 16, 1996
- Fujitsu Limited
- Masaaki Miyajima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern data processing method
- Patent number 5,046,012
- Issue date Sep 3, 1991
- Fujitsu Limited
- Kazumasa Morishita
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING...
- Publication number 20090239160
- Publication date Sep 24, 2009
- Fujitsu Microelectronics Limited
- Masaaki MIYAJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable rectangle-type electron beam exposure apparatus and patter...
- Publication number 20060169925
- Publication date Aug 3, 2006
- FUJITSU LIMITED
- Masaaki Miyajima
- B82 - NANO-TECHNOLOGY
Information Patent Application
Variable rectangle-type electron beam exposure apparatus and patter...
- Publication number 20060076513
- Publication date Apr 13, 2006
- FUJITSU LIMITED
- Yutaka Nakamura
- B82 - NANO-TECHNOLOGY

Masaaki Miyajima

Person

Patents Grantslast 30 patents

Preparing data for hybrid exposure using both electron beam exposur...

Variable rectangle-type electron beam exposure apparatus and patter...

Method and apparatus for generating semiconductor exposure data

Method and apparatus for generating exposure data of semiconductor...

Block exposure of semiconductor wafer

Block exposure of semiconductor wafer

Pattern judging method, mask producing method, and method of dividi...

Pattern data processing method

Patents Applicationslast 30 patents

METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING...

Variable rectangle-type electron beam exposure apparatus and patter...

Variable rectangle-type electron beam exposure apparatus and patter...