Masaaki Takasuka

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition
- Patent number 9,785,048
- Issue date Oct 10, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Masaaki Takasuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 9,746,769
- Issue date Aug 29, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Masaaki Takasuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 9,354,516
- Issue date May 31, 2016
- Mitsubishi Gas Chemical Company, Inc.
- Masaaki Takasuka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Cyclic compound, production process thereof, radiation-sensitive co...
- Patent number 8,969,629
- Issue date Mar 3, 2015
- Mitsubishi Gas Chemical Company, Inc.
- Masaaki Takasuka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Enic compounds, sulfur-containing polyenic compound, sulfur-contain...
- Patent number 7,026,372
- Issue date Apr 11, 2006
- Mitsubishi Gas Chemical Company, Inc.
- Kenji Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Enic compounds, sulfur-containing polyenic compound, sulfur-contain...
- Patent number 6,872,333
- Issue date Mar 29, 2005
- Mitsubishi Gas Chemical Company, Ltd.
- Kenji Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing a resin having a large refractive index
- Patent number 6,534,589
- Issue date Mar 18, 2003
- Mitsubishi Gas Chemical Company Inc
- Yuichi Yoshimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for tinting a resin for optical materials
- Patent number 6,365,223
- Issue date Apr 2, 2002
- Mitsubishi Gas Chemical Company, Inc.
- Yuichi Yoshimura
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION
- Publication number 20160124303
- Publication date May 5, 2016
- Mitsubishi Gas Chemical Company, Inc.
- Masaaki Takasuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20150286136
- Publication date Oct 8, 2015
- MITSUBISHI GAS CHEMICAL COMPANY, INC
- Masaaki Takasuka
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE CO...
- Publication number 20120282546
- Publication date Nov 8, 2012
- Masaaki Takasuka
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Enic compounds, sulfur-containing polyenic compound, sulfur-contain...
- Publication number 20050154073
- Publication date Jul 14, 2005
- Kenji Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Enic compounds, sulfur-containing polyenic compound, sulfur-contain...
- Publication number 20030195270
- Publication date Oct 16, 2003
- Kenji Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Process for the production of film having refractive index distribu...
- Publication number 20020192601
- Publication date Dec 19, 2002
- MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Masaaki Takasuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masaaki Takasuka

Person

Patents Grantslast 30 patents

Resist composition

Resist composition

Resist composition

Cyclic compound, production process thereof, radiation-sensitive co...

Enic compounds, sulfur-containing polyenic compound, sulfur-contain...

Enic compounds, sulfur-containing polyenic compound, sulfur-contain...

Process for producing a resin having a large refractive index

Process for tinting a resin for optical materials

Patents Applicationslast 30 patents

RESIST COMPOSITION

RESIST COMPOSITION

CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE CO...

Enic compounds, sulfur-containing polyenic compound, sulfur-contain...

Enic compounds, sulfur-containing polyenic compound, sulfur-contain...

Process for the production of film having refractive index distribu...