Masafumi AKITA

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,982,935
- Issue date May 14, 2024
- AGC Inc.
- Hirotomo Kawahara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PIEZOELECTRIC LAMINATE, PIEZOELECTRIC ELEMENT, AND PRODUCTION METHO...
- Publication number 20250057048
- Publication date Feb 13, 2025
- AGC Inc.
- Kenichi UMEDA
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20240201576
- Publication date Jun 20, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20220075256
- Publication date Mar 10, 2022
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS