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Masafumi FUJISAKI
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
Patent number
11,099,479
Issue date
Aug 24, 2021
Tokyo Ohka Kogyo Co., Ltd.
Takashi Nagamine
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition, method of forming resist pattern, compound, and...
Patent number
11,036,132
Issue date
Jun 15, 2021
Tokyo Ohka Kogyo Co., Ltd.
Takashi Nagamine
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,921,711
Issue date
Feb 16, 2021
Tokyo Ohka Kogyo Co., Ltd.
Masafumi Fujisaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,627,717
Issue date
Apr 21, 2020
Tokyo Ohka Kogyo Co., Ltd.
Junichi Tsuchiya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of recovering resist pattern
Patent number
10,429,740
Issue date
Oct 1, 2019
Tokyo Ohka Kogyo Co., Ltd.
Junichi Tsuchiya
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200004142
Publication date
Jan 2, 2020
Tokyo Ohka Kogyo Co., Ltd.
Junichi TSUCHIYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20200004143
Publication date
Jan 2, 2020
Tokyo Ohka Kogyo Co., Ltd.
Junichi TSUCHIYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20190354011
Publication date
Nov 21, 2019
Tokyo Ohka Kogyo Co., Ltd.
Tomohiro OIKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
Publication number
20190219920
Publication date
Jul 18, 2019
Tokyo Ohka Kogyo Co., Ltd.
Takashi NAGAMINE
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
Publication number
20190204735
Publication date
Jul 4, 2019
Tokyo Ohka Kogyo Co., Ltd.
Takashi NAGAMINE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20180284611
Publication date
Oct 4, 2018
Tokyo Ohka Kogyo Co., Ltd.
Masafumi FUJISAKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20180284612
Publication date
Oct 4, 2018
Tokyo Ohka Kogyo Co., Ltd.
Junichi TSUCHIYA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD OF RECOVERING RESIST PATTERN
Publication number
20160274464
Publication date
Sep 22, 2016
Tokyo Ohka Kogyo Co., Ltd.
Junichi TSUCHIYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY