Masafumi HORI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,705,331
- Issue date Jul 18, 2023
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for film formation, film-forming method and directed se...
- Patent number 11,460,767
- Issue date Oct 4, 2022
- JSR Corporation
- Hiroyuki Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 11,370,872
- Issue date Jun 28, 2022
- JSR Corporation
- Masafumi Hori
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern-forming method, and composition
- Patent number 11,335,559
- Issue date May 17, 2022
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,211,246
- Issue date Dec 28, 2021
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 10,950,438
- Issue date Mar 16, 2021
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-forming method and composition
- Patent number 10,691,019
- Issue date Jun 23, 2020
- JSR Corporation
- Hiroyuki Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 10,048,586
- Issue date Aug 14, 2018
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 9,760,004
- Issue date Sep 12, 2017
- JSR Corporation
- Hiromu Miyata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,513,548
- Issue date Dec 6, 2016
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,335,630
- Issue date May 10, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,298,090
- Issue date Mar 29, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,223,207
- Issue date Dec 29, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,170,488
- Issue date Oct 27, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,164,387
- Issue date Oct 20, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and pattern-forming method
- Patent number 9,158,196
- Issue date Oct 13, 2015
- JSR Corporation
- Kazuki Kasahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,122,163
- Issue date Sep 1, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method, resist pattern-forming radiation-sen...
- Patent number 9,046,765
- Issue date Jun 2, 2015
- JSR Corporation
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,034,559
- Issue date May 19, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition for making resist pattern insoluble, and method f...
- Patent number 9,029,067
- Issue date May 12, 2015
- JSR Corporation
- Gouji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition for making resist pattern insoluble, and method f...
- Patent number 8,877,429
- Issue date Nov 4, 2014
- JSR Corporation
- Gouji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 8,815,493
- Issue date Aug 26, 2014
- JSR Corporation
- Koji Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 8,795,954
- Issue date Aug 5, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,728,706
- Issue date May 20, 2014
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and resist film formed using...
- Patent number 8,609,319
- Issue date Dec 17, 2013
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20210166935
- Publication date Jun 3, 2021
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION
- Publication number 20200357633
- Publication date Nov 12, 2020
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM-FORMING METHOD AND DIRECTED SE...
- Publication number 20190233561
- Publication date Aug 1, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION
- Publication number 20190235386
- Publication date Aug 1, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20190198316
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...
- Publication number 20190194365
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20190198317
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20190135967
- Publication date May 9, 2019
- JSR Corporation
- Masafumi HORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION
- Publication number 20180342387
- Publication date Nov 29, 2018
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20160179003
- Publication date Jun 23, 2016
- JSR Corporation
- Yuusuke ASANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20150177616
- Publication date Jun 25, 2015
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20150093703
- Publication date Apr 2, 2015
- JSR Corporation
- Hiromu MIYATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
- Publication number 20150004547
- Publication date Jan 1, 2015
- JSR Corporation
- Gouji WAKAMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140363766
- Publication date Dec 11, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140295350
- Publication date Oct 2, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20140212813
- Publication date Jul 31, 2014
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...
- Publication number 20140023968
- Publication date Jan 23, 2014
- JSR Corporation
- Hiromitsu NAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130295506
- Publication date Nov 7, 2013
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130230803
- Publication date Sep 5, 2013
- JSR Corporation
- Koji ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20130230804
- Publication date Sep 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130224661
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130224666
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20130216948
- Publication date Aug 22, 2013
- JSR Corporation
- Kazuki KASAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120237875
- Publication date Sep 20, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...
- Publication number 20120082935
- Publication date Apr 5, 2012
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...
- Publication number 20110223544
- Publication date Sep 15, 2011
- JSR Corporation
- Yuji YADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD
- Publication number 20110123936
- Publication date May 26, 2011
- JSR Corporation
- Masafumi HORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...
- Publication number 20110111349
- Publication date May 12, 2011
- JSR Corporation
- Gouji WAKAMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masafumi HORI

Person

Patents Grantslast 30 patents

Method and composition for selectively modifying base material surface

Composition for film formation, film-forming method and directed se...

Composition for pattern formation, and pattern-forming method

Pattern-forming method, and composition

Method and composition for selectively modifying base material surface

Method and composition for selectively modifying base material surface

Pattern-forming method and composition

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition and resist pattern-forming me...

Radiation-sensitive resin composition, method for forming resist pa...

Pattern-forming method, and radiation-sensitive composition

Pattern-forming method, and radiation-sensitive composition

Resist pattern-forming method, and radiation-sensitive resin compos...

Resist pattern-forming method, and radiation-sensitive resin compos...

Pattern-forming method, and radiation-sensitive resin composition

Radiation-sensitive resin composition and pattern-forming method

Pattern-forming method, and radiation-sensitive resin composition

Resist pattern-forming method, resist pattern-forming radiation-sen...

Pattern-forming method, and radiation-sensitive composition

Resin composition for making resist pattern insoluble, and method f...

Resin composition for making resist pattern insoluble, and method f...

Resist pattern-forming method, and radiation-sensitive resin compos...

Resist pattern-forming method, and radiation-sensitive resin compos...

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition and resist film formed using...

Patents Applicationslast 30 patents

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

PATTERN-FORMING METHOD, AND COMPOSITION

COMPOSITION FOR FILM FORMATION, FILM-FORMING METHOD AND DIRECTED SE...

PATTERN-FORMING METHOD AND COMPOSITION

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

PATTERN-FORMING METHOD, AND COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...

RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...

RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD

RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD F...