Masafumi URAKAWA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Member and plasma processing apparatus
- Patent number 11,037,763
- Issue date Jun 15, 2021
- Tokyo Electron Limited
- Yuki Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,707,053
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,870,898
- Issue date Jan 16, 2018
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 9,865,471
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Gaku Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,653,316
- Issue date May 16, 2017
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate and substrate processing apparatus
- Patent number 9,530,657
- Issue date Dec 27, 2016
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon oxide film
- Patent number 9,257,301
- Issue date Feb 9, 2016
- Tokyo Electron Limited
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 9,224,616
- Issue date Dec 29, 2015
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing device, electrode, electrode plate, and processing method
- Patent number 8,038,835
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Kazuichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MEMBER AND PLASMA PROCESSING APPARATUS
- Publication number 20180350567
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Yuki SUGAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180096822
- Publication date Apr 5, 2018
- TOKYO ELECTRON LIMITED
- Masafumi URAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20160322230
- Publication date Nov 3, 2016
- TOKYO ELECTRON LIMITED
- Gaku SHIMODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20160247666
- Publication date Aug 25, 2016
- TOKYO ELECTRON LIMITED
- Masafumi URAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150140828
- Publication date May 21, 2015
- TOKYO ELECTRON LIMITED
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20150132967
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Masafumi URAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON OXIDE FILM
- Publication number 20150056808
- Publication date Feb 26, 2015
- TOKYO ELECTRON LIMITED
- Masahiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20140235062
- Publication date Aug 21, 2014
- TOKYO ELECTRON LIMITED
- Masafumi URAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING DEVICE, ELECTRODE, ELECTRODE PLATE, AND PROCESSING METHOD
- Publication number 20100230386
- Publication date Sep 16, 2010
- TOKYO ELECTRON LIMITED
- Kazuichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing device, electrode, electrode plate, and processing method
- Publication number 20050092435
- Publication date May 5, 2005
- TOKYO ELECTRON LIMITED
- Kazuichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS

Masafumi URAKAWA

Person

Patents Grantslast 30 patents

Member and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Etching method and etching apparatus

Plasma processing method and plasma processing apparatus

Method of processing substrate and substrate processing apparatus

Method of etching silicon oxide film

Etching method and plasma processing apparatus

Processing device, electrode, electrode plate, and processing method

Patents Applicationslast 30 patents

MEMBER AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

METHOD OF ETCHING SILICON OXIDE FILM

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PROCESSING DEVICE, ELECTRODE, ELECTRODE PLATE, AND PROCESSING METHOD

Processing device, electrode, electrode plate, and processing method