Masaharu Nishiumi

Follow

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Control apparatus for plasma utilizing equipment
- Patent number 6,754,552
- Issue date Jun 22, 2004
- Hitachi, Ltd.
- Masaharu Nishiumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus having insulator disposed on inner surf...
- Patent number 6,046,425
- Issue date Apr 4, 2000
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus including ground electrode with protection...
- Patent number 5,432,315
- Issue date Jul 11, 1995
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing device
- Patent number 5,290,993
- Issue date Mar 1, 1994
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching
- Patent number 5,110,408
- Issue date May 5, 1992
- Hitachi, Ltd.
- Takashi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 4,618,398
- Issue date Oct 21, 1986
- Hitachi, Ltd.
- Makoto Nawata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for monitoring etching
- Patent number 4,609,426
- Issue date Sep 2, 1986
- Hitachi, Ltd.
- Yoshifumi Ogawa
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Control apparatus for plasma utilizing equipment
- Publication number 20020052668
- Publication date May 2, 2002
- Masaharu Nishiumi
- H01 - BASIC ELECTRIC ELEMENTS