Masahide Iwakata

Person

Taito-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank and photomask
- Patent number 8,007,964
- Issue date Aug 30, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,771,893
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask
- Patent number 7,691,546
- Issue date Apr 6, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,625,676
- Issue date Dec 1, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask and method for producing those
- Patent number 7,618,753
- Issue date Nov 17, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-depositing target and preparation of phase shift mask blank
- Patent number 7,598,004
- Issue date Oct 6, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Patent number 7,556,892
- Issue date Jul 7, 2009
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100143831
- Publication date Jun 10, 2010
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK
- Publication number 20090057143
- Publication date Mar 5, 2009
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask Blank and Photomask
- Publication number 20080063950
- Publication date Mar 13, 2008
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask Blank, Photomask and Method for Producing Those
- Publication number 20070259276
- Publication date Nov 8, 2007
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20070020534
- Publication date Jan 25, 2007
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20060088774
- Publication date Apr 27, 2006
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Publication number 20050244722
- Publication date Nov 3, 2005
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film-depositing target and preparation of phase shift mask blank
- Publication number 20050217988
- Publication date Oct 6, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masahide Iwakata

Person

Patents Grantslast 30 patents

Photomask blank and photomask

Photomask blank, photomask and fabrication method thereof

Photomask blank and photomask

Photomask blank, photomask and fabrication method thereof

Photomask blank, photomask and method for producing those

Film-depositing target and preparation of phase shift mask blank

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Patents Applicationslast 30 patents

PHOTOMASK BLANK AND PHOTOMASK

FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK

Photomask Blank and Photomask

Photomask Blank, Photomask and Method for Producing Those

Photomask blank, photomask and fabrication method thereof

Photomask blank, photomask and fabrication method thereof

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Film-depositing target and preparation of phase shift mask blank