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Plasma processing apparatus
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Patent number 6,231,726
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Issue date May 15, 2001
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Matsushita Electric Industrial Co., Ltd.
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Toshiyuki Suemitsu
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Magnetron sputtering apparatus and method
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Patent number 5,865,961
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Issue date Feb 2, 1999
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Matsushita Electric Industrial Co., Ltd.
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Masahide Yokoyama
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Sputtering apparatus and method
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Patent number 5,626,727
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Issue date May 6, 1997
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Matsushita Electric Industrial Co., Ltd.
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Hitoshi Yamanishi
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H01 - BASIC ELECTRIC ELEMENTS
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Magnetron sputtering apparatus and method
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Patent number 5,558,749
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Issue date Sep 24, 1996
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Matsushita Electric Industrial Co., Ltd.
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Masahide Yokoyama
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Ionization deposition apparatus
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Patent number 5,554,222
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Issue date Sep 10, 1996
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Matsushita Electric Industrial Co., Ltd.
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Munekazu Nishihara
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Sputtering apparatus
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Patent number 5,082,545
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Issue date Jan 21, 1992
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Matsushita Electric Industrial Co., Ltd.
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Kunio Tanaka
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...