Masahiko Inoue

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,011,634
- Issue date Apr 21, 2015
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method, plasma film...
- Patent number 8,662,010
- Issue date Mar 4, 2014
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,480,912
- Issue date Jul 9, 2013
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method and plasma treatment device
- Patent number 7,972,946
- Issue date Jul 5, 2011
- Mitsubishi Heavy Industries, Ltd.
- Tadashi Shimazu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for measuring wafer potential or temperature
- Patent number 7,335,315
- Issue date Feb 26, 2008
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma CVD apparatus
- Patent number 7,314,525
- Issue date Jan 1, 2008
- Mitsubishi Heavy Industries, Ltd.
- Tadashi Shimazu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck and its manufacturing method
- Patent number 7,283,346
- Issue date Oct 16, 2007
- Mitsubishi Heavy Industries, Ltd.
- Kazuto Yoshida
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130025790
- Publication date Jan 31, 2013
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE
- Publication number 20090176380
- Publication date Jul 9, 2009
- Mitsubishi Heavy Industries, Ltd.
- Tadashi Shimazu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090127227
- Publication date May 21, 2009
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20080115728
- Publication date May 22, 2008
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, plasma processing method, plasma film...
- Publication number 20070224364
- Publication date Sep 27, 2007
- Ryuichi Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing system, plasma processing method, plasma film dep...
- Publication number 20050202183
- Publication date Sep 15, 2005
- Mitsubishi Heavy Industries, Ltd.
- Ryuichi Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and device for measuring wafer potential or temperature
- Publication number 20050174135
- Publication date Aug 11, 2005
- Ryuichi Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck and its manufacturing method
- Publication number 20040233609
- Publication date Nov 25, 2004
- Kazuto Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma CVD apparatus
- Publication number 20030145788
- Publication date Aug 7, 2003
- Mitsubishi Heavy Industries, Ltd.
- Tadashi Shimazu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masahiko Inoue

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus, plasma processing method, plasma film...

Plasma processing apparatus and plasma processing method

Plasma treatment method and plasma treatment device

Method and device for measuring wafer potential or temperature

Plasma CVD apparatus

Electrostatic chuck and its manufacturing method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma Processing Apparatus

Plasma processing apparatus, plasma processing method, plasma film...

Plasma processing system, plasma processing method, plasma film dep...

Method and device for measuring wafer potential or temperature

Electrostatic chuck and its manufacturing method

Plasma CVD apparatus