Masahiko Matsudo

Person

Hosaka-cho, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Processing device using shower head structure and processing method
- Patent number 7,615,251
- Issue date Nov 10, 2009
- Tokyo Electron Limited
- Akinobu Kakimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing tungsten silicide film and method for prepari...
- Patent number 6,821,874
- Issue date Nov 23, 2004
- Tokyo Electron Limited
- Masahiko Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning gas and method for cleaning vacuum treatment apparatus by...
- Patent number 6,659,111
- Issue date Dec 9, 2003
- Central Glass Company, Limited
- Isamu Mouri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treating method for thin film and forming method for thin film
- Patent number 6,448,178
- Issue date Sep 10, 2002
- Tokyo Electron Limited
- Kenji Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Testing method including the removal of insulative films for electr...
- Patent number 6,057,694
- Issue date May 2, 2000
- Tokyo Electron Limited
- Masahiko Matsudo
- G01 - MEASURING TESTING
Information Patent Grant
Heat-resistant electrode material, electrode using the same, and ap...
- Patent number 5,698,035
- Issue date Dec 16, 1997
- Tokyo Electron Limited
- Masahiko Matsudo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of coating a conductive probe needle
- Patent number 5,690,998
- Issue date Nov 25, 1997
- Tokyo Electron Kabushiki Kaisha
- Yasushi Nagasawa
- G01 - MEASURING TESTING
Information Patent Grant
Probe needle
- Patent number 5,532,613
- Issue date Jul 2, 1996
- Tokyo Electron Kabushiki Kaisha
- Yasushi Nagasawa
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 5,252,892
- Issue date Oct 12, 1993
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator
- Patent number 5,101,110
- Issue date Mar 31, 1992
- Tokyo Electron Limited
- Masahiko Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation equipment
- Patent number 5,089,710
- Issue date Feb 18, 1992
- Tokyo Electron Limited
- Shuji Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron generating apparatus
- Patent number 5,049,784
- Issue date Sep 17, 1991
- Tokyo Electron Limited
- Masahiko Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam excitation ion source
- Patent number 5,028,791
- Issue date Jul 2, 1991
- Tokyo Electron Ltd.
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Processing device using shower head structure and processing method
- Publication number 20050223981
- Publication date Oct 13, 2005
- Akinobu Kakimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing tungsten silicide film and method for prepari...
- Publication number 20010008796
- Publication date Jul 19, 2001
- Masahiko Matsudo
- H01 - BASIC ELECTRIC ELEMENTS

Masahiko Matsudo

Person

Patents Grantslast 30 patents

Processing device using shower head structure and processing method

Method for depositing tungsten silicide film and method for prepari...

Cleaning gas and method for cleaning vacuum treatment apparatus by...

Heat treating method for thin film and forming method for thin film

Testing method including the removal of insulative films for electr...

Heat-resistant electrode material, electrode using the same, and ap...

Method of coating a conductive probe needle

Probe needle

Plasma processing apparatus

Ion generator

Ion implantation equipment

Electron generating apparatus

Electron beam excitation ion source

Patents Applicationslast 30 patents

Processing device using shower head structure and processing method

Method for depositing tungsten silicide film and method for prepari...