Masahiko Nakamori

Person

Shiga, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Elastic network structure with excellent quietness and hardness
- Patent number 11,168,421
- Issue date Nov 9, 2021
- Toyobo Co., Ltd.
- Hiroyuki Wakui
- B68 - SADDLERY UPHOLSTERY
Information Patent Grant
Polyimide nonwoven fabric and process for production thereof
- Patent number 9,394,638
- Issue date Jul 19, 2016
- Toyo Boseki Kabushiki Kaisha
- Masahiko Nakamori
- D04 - BRAIDING LACE-MAKING KNITTING TRIMMINGS NON-WOVEN FABRICS
Information Patent Grant
Polyamide imide fiber, non-woven fabric composed of the fiber, proc...
- Patent number 9,023,534
- Issue date May 5, 2015
- Toyo Boseki Kabushiki Kaisha
- Masahiko Nakamori
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Polishing pad and method of producing semiconductor device
- Patent number 8,845,852
- Issue date Sep 30, 2014
- Toyo Tire & Rubber Co., Ltd.
- Masahiko Nakamori
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 8,779,020
- Issue date Jul 15, 2014
- Toyo Tire & Rubber Co., Ltd.
- Atsushi Kazuno
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 8,530,535
- Issue date Sep 10, 2013
- Toyo Tire & Rubber Co., Ltd.
- Atsushi Kazuno
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and method of producing the same
- Patent number 8,318,825
- Issue date Nov 27, 2012
- Toyo Tire & Rubber Co., Ltd.
- Tetsuo Shimomura
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 8,309,466
- Issue date Nov 13, 2012
- Toyo Tire & Rubber Co., Ltd.
- Kazuyuki Ogawa
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 8,304,467
- Issue date Nov 6, 2012
- Toyo Tire & Rubber Co., Ltd.
- Atsushi Kazuno
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and manufacturing method thereof
- Patent number 8,148,441
- Issue date Apr 3, 2012
- Toyo Tire & Rubber Co., Ltd.
- Masato Doura
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 7,871,309
- Issue date Jan 18, 2011
- Toyo Tire & Rubber Co., Ltd.
- Kazuyuki Ogawa
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and cushion layer for polishing pad
- Patent number 7,762,870
- Issue date Jul 27, 2010
- Toyo Tire & Rubber Co., Ltd.
- Koichi Ono
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and semiconductor device manufacturing method
- Patent number 7,731,568
- Issue date Jun 8, 2010
- Toyo Tire & Rubber Co., Ltd.
- Tetsuo Shimomura
- B24 - GRINDING POLISHING
Information Patent Grant
Grinding pad and method of producing the same
- Patent number 7,651,761
- Issue date Jan 26, 2010
- Toyo Tire & Rubber Co., Ltd.
- Tetsuo Shimomura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polishing pad and cushion layer for polishing pad
- Patent number 7,641,540
- Issue date Jan 5, 2010
- Toyo Tire & Rubber Co., Ltd.
- Koichi Ono
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and method of producing the same
- Patent number 7,488,236
- Issue date Feb 10, 2009
- Toyo Tire & Rubber Co., Ltd.
- Tetsuo Shimomura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polishing pad and method for manufacture of semiconductor device us...
- Patent number 7,470,170
- Issue date Dec 30, 2008
- Toyo Tire & Rubber Co., Ltd.
- Tetsuo Shimomura
- B24 - GRINDING POLISHING
Information Patent Grant
Polyurethane composition and polishing pad
- Patent number 7,378,454
- Issue date May 27, 2008
- Toyo Tire & Rubber Co., Ltd.
- Takashi Masui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing polishing pad
- Patent number 7,329,170
- Issue date Feb 12, 2008
- Toyo Tire & Rubber Co., Ltd.
- Koichi Ono
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, method of producing the same, and cushion layer for...
- Patent number 7,192,340
- Issue date Mar 20, 2007
- Toyo Tire & Rubber Co., Ltd.
- Koichi Ono
- B24 - GRINDING POLISHING
Information Patent Grant
Photosensitive resin composition
- Patent number 6,245,483
- Issue date Jun 12, 2001
- Toyo Boseki Kabushiki Kaisha
- Chihiro Oshimo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ELASTIC NETWORK STRUCTURE WITH EXCELLENT QUIETNESS AND HARDNESS
- Publication number 20150087196
- Publication date Mar 26, 2015
- Toyobo Co., Ltd.
- Hiroyuki Wakui
- D10 - INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEX...
Information Patent Application
POLISHING PAD
- Publication number 20130005228
- Publication date Jan 3, 2013
- Toyo Tire & Rubber Co., Ltd.
- Atsushi KAZUNO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD
- Publication number 20110218263
- Publication date Sep 8, 2011
- Toyo Tire & Rubber Co., Ltd.
- Atsushi KAZUNO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYIMIDE NONWOVEN FABRIC AND PROCESS FOR PRODUCTION THEREOF
- Publication number 20100178830
- Publication date Jul 15, 2010
- Toyo Boseki Kabushiki Kaisha
- Masahiko Nakamori
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
POLYAMIDE IMIDE FIBER, NON-WOVEN FABRIC COMPOSED OF THE FIBER, PROC...
- Publication number 20100151333
- Publication date Jun 17, 2010
- Masahiko Nakamori
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
POLISHING PAD
- Publication number 20090253353
- Publication date Oct 8, 2009
- Toyo Tire & Rubber Co., Ltd.
- Kazuyuki Ogawa
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD
- Publication number 20090104850
- Publication date Apr 23, 2009
- Toyo Tire & Rubber Co., Ltd.
- Kazuyuki Ogawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD
- Publication number 20090093201
- Publication date Apr 9, 2009
- Atsushi Kazuno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polishing Pad and Manufacturing Method Thereof
- Publication number 20080085943
- Publication date Apr 10, 2008
- Toyo Tire & Rubber Co., Ltd.
- Masato Doura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polishing pad and semiconductor device manufacturing method
- Publication number 20070190905
- Publication date Aug 16, 2007
- Tetsuo Shimomura
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad and method for manufacture of semiconductor device us...
- Publication number 20070178812
- Publication date Aug 2, 2007
- Toyo Tire & Rubber Co., Ltd.
- Tetsuo Shimomura
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND METHOD OF PRODUCING THE SAME
- Publication number 20060280930
- Publication date Dec 14, 2006
- Tetsuo Shimomura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD AND METHOD OF PRODUCING THE SAME
- Publication number 20060280929
- Publication date Dec 14, 2006
- Tetsuo Shimomura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polishing pad and cushion layer for polishing pad
- Publication number 20060148393
- Publication date Jul 6, 2006
- Koichi Ono
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad and cushion layer for polishing pad
- Publication number 20060148391
- Publication date Jul 6, 2006
- Koichi Ono
- B24 - GRINDING POLISHING
Information Patent Application
Method of producing polishing pad
- Publication number 20060148392
- Publication date Jul 6, 2006
- Koichi Ono
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad and method for manufacturing semiconductor device
- Publication number 20060037699
- Publication date Feb 23, 2006
- Masahiko Nakamori
- B24 - GRINDING POLISHING
Information Patent Application
Grinding pad and method of producing the same
- Publication number 20050064709
- Publication date Mar 24, 2005
- Tetsuo Shimomura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polyurethane composition and polishing pad
- Publication number 20040157985
- Publication date Aug 12, 2004
- Takashi Masui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polishing pad, method of manufacturing the polishing pad, and cushi...
- Publication number 20040055223
- Publication date Mar 25, 2004
- Koichi Ono
- B24 - GRINDING POLISHING

Masahiko Nakamori

Person

Patents Grantslast 30 patents

Elastic network structure with excellent quietness and hardness

Polyimide nonwoven fabric and process for production thereof

Polyamide imide fiber, non-woven fabric composed of the fiber, proc...

Polishing pad and method of producing semiconductor device

Polishing pad

Polishing pad

Polishing pad and method of producing the same

Polishing pad

Polishing pad

Polishing pad and manufacturing method thereof

Polishing pad

Polishing pad and cushion layer for polishing pad

Polishing pad and semiconductor device manufacturing method

Grinding pad and method of producing the same

Polishing pad and cushion layer for polishing pad

Polishing pad and method of producing the same

Polishing pad and method for manufacture of semiconductor device us...

Polyurethane composition and polishing pad

Method of producing polishing pad

Polishing pad, method of producing the same, and cushion layer for...

Photosensitive resin composition

Patents Applicationslast 30 patents

ELASTIC NETWORK STRUCTURE WITH EXCELLENT QUIETNESS AND HARDNESS

POLISHING PAD

POLISHING PAD

POLYIMIDE NONWOVEN FABRIC AND PROCESS FOR PRODUCTION THEREOF

POLYAMIDE IMIDE FIBER, NON-WOVEN FABRIC COMPOSED OF THE FIBER, PROC...

POLISHING PAD

POLISHING PAD

POLISHING PAD

Polishing Pad and Manufacturing Method Thereof

Polishing pad and semiconductor device manufacturing method

Polishing pad and method for manufacture of semiconductor device us...

POLISHING PAD AND METHOD OF PRODUCING THE SAME

POLISHING PAD AND METHOD OF PRODUCING THE SAME

Polishing pad and cushion layer for polishing pad

Polishing pad and cushion layer for polishing pad

Method of producing polishing pad

Polishing pad and method for manufacturing semiconductor device

Grinding pad and method of producing the same

Polyurethane composition and polishing pad

Polishing pad, method of manufacturing the polishing pad, and cushi...