Masahiko Okumura

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Immersion lithographic apparatus rinsing outer contour of substrate...
- Patent number 8,941,808
- Issue date Jan 27, 2015
- Nikon Corporation
- Katsushi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and device manufacturing method
- Patent number 8,780,326
- Issue date Jul 15, 2014
- Nikon Corporation
- Tohru Kiuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, cleaning method, and device fabricating method
- Patent number 8,654,306
- Issue date Feb 18, 2014
- Nikon Corporation
- Kenichi Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, exposure apparatus, and method for pro...
- Patent number 8,040,489
- Issue date Oct 18, 2011
- Nikon Corporation
- Katsushi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric position-measuring devices and methods
- Patent number 7,876,452
- Issue date Jan 25, 2011
- Nikon Corporation
- Michael R. Sogard
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus and stage device, and device manufacturing method
- Patent number 7,068,350
- Issue date Jun 27, 2006
- Nikon Corporation
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for calibrating mirrors of a stage assembly
- Patent number 6,842,248
- Issue date Jan 11, 2005
- Nikon Corporation
- Mike Binnard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for positioning substrate and the like
- Patent number 6,624,433
- Issue date Sep 23, 2003
- Nikon Corporation
- Masahiko Okumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for positioning substrate
- Patent number 6,400,445
- Issue date Jun 4, 2002
- Nikon Corporation
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for positioning substrate
- Patent number 6,225,012
- Issue date May 1, 2001
- Nikon Corporation
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position control method in exposure apparatus
- Patent number 6,141,108
- Issue date Oct 31, 2000
- Nikon Corporation
- Yoshiki Kida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method
- Patent number 6,122,036
- Issue date Sep 19, 2000
- Nikon Corporation
- Shigeru Yamasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for measuring image-formation characteristics of a projecti...
- Patent number 5,985,495
- Issue date Nov 16, 1999
- Nikon Corporation
- Masahiko Okumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for aligning a mask and a set of substrates to...
- Patent number 5,798,530
- Issue date Aug 25, 1998
- Nikon Corporation
- Masahiko Okumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus having an alignment sensor for aligni...
- Patent number 5,654,553
- Issue date Aug 5, 1997
- Nikon Corporation
- Masaharu Kawakubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tilting apparatus
- Patent number 5,473,424
- Issue date Dec 5, 1995
- Nikon Corporation
- Masahiko Okumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Substrate processing method, exposure apparatus, and method for pro...
- Publication number 20120008112
- Publication date Jan 12, 2012
- Nikon Corporation
- Katsushi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and device manufacturing method
- Publication number 20110222037
- Publication date Sep 15, 2011
- Nikon Corporation
- Tohru Kiuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, cleaning method, and device fabricating method
- Publication number 20090316120
- Publication date Dec 24, 2009
- Nikon Corporation
- Kenichi Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLDING DEVICE AND EXPOSURE APPARATUS
- Publication number 20090097009
- Publication date Apr 16, 2009
- Nikon Corporation
- Masahiko OKUMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS
- Publication number 20080291464
- Publication date Nov 27, 2008
- NIKON CORPORATION
- Michael R. Sogard
- G01 - MEASURING TESTING
Information Patent Application
Substrate processing method, exposure apparatus, and method for pro...
- Publication number 20080246931
- Publication date Oct 9, 2008
- Nikon Corporation
- Katsushi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate Processing Method, Exposure Apparatus, and Method For Pro...
- Publication number 20080143980
- Publication date Jun 19, 2008
- Nikon Corporation
- Katsushi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and device manufacturing method
- Publication number 20080137047
- Publication date Jun 12, 2008
- Nikon Corporation
- Takeyuki Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method, exposure apparatus, and method for pro...
- Publication number 20070242248
- Publication date Oct 18, 2007
- Nikon Corporation
- Katsushi Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage apparatus and exposure apparatus
- Publication number 20070188732
- Publication date Aug 16, 2007
- NIKON CORPOATION
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and stage device, and device manufacturing method
- Publication number 20050024610
- Publication date Feb 3, 2005
- Nikon Corporation
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR POSITIONING SUBSTRATE AND THE LIKE
- Publication number 20020113218
- Publication date Aug 22, 2002
- MASAHIKO OKUMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for positioning substrate
- Publication number 20010016293
- Publication date Aug 23, 2001
- Nikon Corporation
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masahiko Okumura

Person

Patents Grantslast 30 patents

Immersion lithographic apparatus rinsing outer contour of substrate...

Exposure apparatus, exposure method, and device manufacturing method

Exposure apparatus, cleaning method, and device fabricating method

Substrate processing method, exposure apparatus, and method for pro...

Interferometric position-measuring devices and methods

Exposure apparatus and stage device, and device manufacturing method

System and method for calibrating mirrors of a stage assembly

Method and apparatus for positioning substrate and the like

Method and apparatus for positioning substrate

Method for positioning substrate

Position control method in exposure apparatus

Projection exposure apparatus and method

Methods for measuring image-formation characteristics of a projecti...

Method and apparatus for aligning a mask and a set of substrates to...

Projection exposure apparatus having an alignment sensor for aligni...

Tilting apparatus

Patents Applicationslast 30 patents

Substrate processing method, exposure apparatus, and method for pro...

Exposure apparatus, exposure method, and device manufacturing method

Exposure apparatus, cleaning method, and device fabricating method

HOLDING DEVICE AND EXPOSURE APPARATUS

INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS

Substrate processing method, exposure apparatus, and method for pro...

Substrate Processing Method, Exposure Apparatus, and Method For Pro...

Exposure apparatus and device manufacturing method

Substrate processing method, exposure apparatus, and method for pro...

Stage apparatus and exposure apparatus

Exposure apparatus and stage device, and device manufacturing method

METHOD AND APPARATUS FOR POSITIONING SUBSTRATE AND THE LIKE

Method for positioning substrate