Masahiko TOMITA

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 10,629,446
- Issue date Apr 21, 2020
- Tokyo Electron Limited
- Masahiko Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,622,205
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Hiroyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,312,101
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Shuji Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide film removing method, oxide film removing apparatus, contact...
- Patent number 9,984,892
- Issue date May 29, 2018
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method for using same
- Patent number 8,183,158
- Issue date May 22, 2012
- Tokyo Electron Limited
- Masahiko Tomita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and method for using the same
- Patent number 8,080,109
- Issue date Dec 20, 2011
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,981,809
- Issue date Jul 19, 2011
- Tokyo Electron Limited
- Tetsuya Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,354,858
- Issue date Apr 8, 2008
- Tokyo Electron Limited
- Yutaka Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,229,917
- Issue date Jun 12, 2007
- Tokyo Electron Limited
- Takahito Umehara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20190181015
- Publication date Jun 13, 2019
- TOKYO ELECTRON LIMITED
- Tomoaki OGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20180330962
- Publication date Nov 15, 2018
- TOKYO ELECTRON LIMITED
- Masahiko TOMITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...
- Publication number 20170338120
- Publication date Nov 23, 2017
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20170316947
- Publication date Nov 2, 2017
- Shuji MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20170294319
- Publication date Oct 12, 2017
- TOKYO ELECTRON LIMITED
- Tomoaki OGIWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160236244
- Publication date Aug 18, 2016
- TOKYO ELECTRON LIMITED
- Hiroyuki TAKAHASHI
- B08 - CLEANING
Information Patent Application
Film formation apparatus and method for using the same
- Publication number 20080282976
- Publication date Nov 20, 2008
- Mitsuhiro Okada
- B08 - CLEANING
Information Patent Application
Semiconductor processing apparatus and method for using same
- Publication number 20080093023
- Publication date Apr 24, 2008
- Masahiko Tomita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20060128161
- Publication date Jun 15, 2006
- Tetsuya Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20050227459
- Publication date Oct 13, 2005
- Yutaka Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20050176261
- Publication date Aug 11, 2005
- Takahito Umehara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Masahiko TOMITA

Person

Patents Grantslast 30 patents

Substrate treatment method and substrate treatment apparatus

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Oxide film removing method, oxide film removing apparatus, contact...

Semiconductor processing apparatus and method for using same

Film formation apparatus and method for using the same

Film formation method and apparatus for semiconductor process

Film formation method and apparatus for semiconductor process

Film formation method and apparatus for semiconductor process

Patents Applicationslast 30 patents

Substrate Processing Method and Substrate Processing Apparatus

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Film formation apparatus and method for using the same

Semiconductor processing apparatus and method for using same

Film formation method and apparatus for semiconductor process

Film formation method and apparatus for semiconductor process

Film formation method and apparatus for semiconductor process