Masahiro Kanayama

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,592,287
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,555,697
- Issue date Jan 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,480,879
- Issue date Oct 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,385,544
- Issue date Jul 12, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20230333472
- Publication date Oct 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST
- Publication number 20200340806
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20200341377
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20200233303
- Publication date Jul 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20200159120
- Publication date May 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORM...
- Publication number 20130280912
- Publication date Oct 24, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130101936
- Publication date Apr 25, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masahiro Kanayama

Person

Patents Grantslast 30 patents

Thermosetting iodine- and silicon-containing material, composition...

Method for measuring distance of diffusion of curing catalyst

Method for measuring distance of diffusion of curing catalyst

Composition for forming silicon-containing resist underlayer film a...

Composition for forming silicon-containing resist underlayer film a...

Patents Applicationslast 30 patents

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORM...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS