Masahiro Masujima

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Anti-reflection film forming material, and method for forming resis...
- Patent number 8,216,775
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition for forming thick-film resist, thick-fi...
- Patent number 8,133,653
- Issue date Mar 13, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi Shimbori
- G11 - INFORMATION STORAGE
Information Patent Grant
Chemically amplified positive photo resist composition and method f...
- Patent number 7,358,028
- Issue date Apr 15, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Kenji Maruyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplified positive photo resist composition and method for...
- Patent number 7,329,478
- Issue date Feb 12, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yusuke Nakagawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...
- Publication number 20230236505
- Publication date Jul 27, 2023
- SAN-APRO LTD.
- Takuto NAKAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING A RESIST PAT...
- Publication number 20100248164
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya KUMAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Anti-reflection film forming material, and method for forming resis...
- Publication number 20090253077
- Publication date Oct 8, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Yuriko Shirai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION FOR FORMING THICK-FILM RESIST, THICK-FI...
- Publication number 20090023102
- Publication date Jan 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi Shimbori
- G11 - INFORMATION STORAGE
Information Patent Application
CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RE...
- Publication number 20070117045
- Publication date May 24, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Kenji Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplified positive photo resist composition and method for...
- Publication number 20060003260
- Publication date Jan 5, 2006
- Yusuke Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive photo resist composition and method f...
- Publication number 20050244740
- Publication date Nov 3, 2005
- Kenji Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming fine resist pattern
- Publication number 20050037291
- Publication date Feb 17, 2005
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masahiro Masujima

Person

Patents Grantslast 30 patents

Anti-reflection film forming material, and method for forming resis...

Positive resist composition for forming thick-film resist, thick-fi...

Chemically amplified positive photo resist composition and method f...

Chemical amplified positive photo resist composition and method for...

Patents Applicationslast 30 patents

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD...

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING A RESIST PAT...

Anti-reflection film forming material, and method for forming resis...

POSITIVE RESIST COMPOSITION FOR FORMING THICK-FILM RESIST, THICK-FI...

CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RE...

Chemical amplified positive photo resist composition and method for...

Chemically amplified positive photo resist composition and method f...

Method for forming fine resist pattern