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Masahiro Miyasaka
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Hitachi-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
Patent number
10,104,781
Issue date
Oct 16, 2018
Hitachi Chemical Company, Ltd.
Shota Okade
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Photosensitive resin composition, photosensitive element, method of...
Patent number
8,592,130
Issue date
Nov 26, 2013
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Photosensitive resin composition, photosensitive element, method of...
Patent number
8,586,284
Issue date
Nov 19, 2013
Hitachi Chemical Company, Ltd.
Hanako Nankawa
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Photosensitive element, method for formation of resist pattern, and...
Patent number
8,501,392
Issue date
Aug 6, 2013
Hitachi Chemical Company, Ltd.
Manabu Saitou
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
Patent number
8,198,008
Issue date
Jun 12, 2012
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
Patent number
8,192,916
Issue date
Jun 5, 2012
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition, and, photosensitive element, meth...
Patent number
8,105,759
Issue date
Jan 31, 2012
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
Patent number
7,993,809
Issue date
Aug 9, 2011
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition, photosensitive element employing...
Patent number
7,736,834
Issue date
Jun 15, 2010
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive element, resist pattern formation method and printed...
Patent number
7,622,243
Issue date
Nov 24, 2009
Hitachi Chemical Company, Ltd.
Takashi Kumaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
Publication number
20160330845
Publication date
Nov 10, 2016
Hitachi Chemical Company, Ltd.
Shota OKADE
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
Publication number
20150293443
Publication date
Oct 15, 2015
HITACHI CHEMICAL COMPANY, LTD.
Shota Okade
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
Publication number
20130298398
Publication date
Nov 14, 2013
Masahiro Miyasaka
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD OF...
Publication number
20110159430
Publication date
Jun 30, 2011
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD OF...
Publication number
20110086309
Publication date
Apr 14, 2011
Hitachi Chemical Company, Ltd.
Hanako Nankawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
Publication number
20100285408
Publication date
Nov 11, 2010
Masahiro MIYASAKA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
Publication number
20100279229
Publication date
Nov 4, 2010
Masahiro MIYASAKA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
Publication number
20100233627
Publication date
Sep 16, 2010
HITACHI CHEMICAL CO., Ltd.
Takashi Kumaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE ELEMENT, METHOD FOR FORMATION OF RESIST PATTERN, AND...
Publication number
20090297982
Publication date
Dec 3, 2009
Manabu Saitou
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, AND, PHOTOSENSITIVE ELEMENT, METH...
Publication number
20090202944
Publication date
Aug 13, 2009
Hitachi Chemical Company, Ltd.
Masahiro Miyasaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photosensitive Resin Composition, Photosensitive Element, Method fo...
Publication number
20090029289
Publication date
Jan 29, 2009
Masahiro Miyasaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Photosensitive resin composition, photosensitive element employing...
Publication number
20070111136
Publication date
May 17, 2007
Masahiro Miyasaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photosensitive element, resist pattern formation method and printed...
Publication number
20070105036
Publication date
May 10, 2007
Takashi Kumaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...