Masahiro Nakamura

Person

Eastchester, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,325,998
- Issue date Jun 18, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image reversal process for tight pitch pillar arrays
- Patent number 10,305,029
- Issue date May 28, 2019
- International Business Machines Corporation
- Nathan P. Marchack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,269,924
- Issue date Apr 23, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet clean process for removing CxHyFz etch residue
- Patent number 10,167,443
- Issue date Jan 1, 2019
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Etch rate enhancement for a silicon etch process through etch chamb...
- Patent number 9,711,365
- Issue date Jul 18, 2017
- International Business Machines Corporation
- Eric A. Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low energy etch process for nitrogen-containing dielectric layer
- Patent number 9,633,948
- Issue date Apr 25, 2017
- GLOBALFOUNDRIES Inc.
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 9,627,533
- Issue date Apr 18, 2017
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet clean process for removing CxHyFz etch residue
- Patent number 9,536,731
- Issue date Jan 3, 2017
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Molecular radical etch chemistry for increased throughput in pulsed...
- Patent number 9,214,355
- Issue date Dec 15, 2015
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low energy etch process for nitrogen-containing dielectric layer
- Patent number 9,190,316
- Issue date Nov 17, 2015
- GlobalFoundries U.S. 2 LLC
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High fidelity patterning employing a fluorohydrocarbon-containing p...
- Patent number 8,916,054
- Issue date Dec 23, 2014
- International Business Machines Corporation
- Markus Brink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High selectivity nitride etch process
- Patent number 8,765,613
- Issue date Jul 1, 2014
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20190305109
- Publication date Oct 3, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20170194497
- Publication date Jul 6, 2017
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20170194457
- Publication date Jul 6, 2017
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE
- Publication number 20170044470
- Publication date Feb 16, 2017
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20160233335
- Publication date Aug 11, 2016
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER
- Publication number 20160111374
- Publication date Apr 21, 2016
- GLOBALFOUNDRIES INC.
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH RATE ENHANCEMENT FOR A SILICON ETCH PROCESS THROUH ETCH CHAMBE...
- Publication number 20150318182
- Publication date Nov 5, 2015
- Zeon Corporation
- Eric A. Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE
- Publication number 20150118839
- Publication date Apr 30, 2015
- International Business Machines Corporation
- Robert L. Bruce
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
MOLECULAR RADICAL ETCH CHEMISTRY FOR INCREASED THROUGHPUT IN PULSED...
- Publication number 20150118854
- Publication date Apr 30, 2015
- International Business Machines Corporation
- Sebastian U. Engelmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING P...
- Publication number 20130108833
- Publication date May 2, 2013
- Zeon Corporation
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER
- Publication number 20130105996
- Publication date May 2, 2013
- Zeon Corporation
- Markus Brink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE ETCH PROCESS
- Publication number 20130105916
- Publication date May 2, 2013
- Zeon Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS

Masahiro Nakamura

Person

Patents Grantslast 30 patents

High selectivity nitride removal process based on selective polymer...

Image reversal process for tight pitch pillar arrays

High selectivity nitride removal process based on selective polymer...

Wet clean process for removing CxHyFz etch residue

Etch rate enhancement for a silicon etch process through etch chamb...

Low energy etch process for nitrogen-containing dielectric layer

High selectivity nitride removal process based on selective polymer...

Wet clean process for removing CxHyFz etch residue

Molecular radical etch chemistry for increased throughput in pulsed...

Low energy etch process for nitrogen-containing dielectric layer

High fidelity patterning employing a fluorohydrocarbon-containing p...

High selectivity nitride etch process

Patents Applicationslast 30 patents

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER

ETCH RATE ENHANCEMENT FOR A SILICON ETCH PROCESS THROUH ETCH CHAMBE...

WET CLEAN PROCESS FOR REMOVING CxHyFz ETCH RESIDUE

MOLECULAR RADICAL ETCH CHEMISTRY FOR INCREASED THROUGHPUT IN PULSED...

HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING P...

LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER

HIGH SELECTIVITY NITRIDE ETCH PROCESS