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Masahiro OKA
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Miyagi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Method for forming boron-based film, formation apparatus
Patent number
11,615,957
Issue date
Mar 28, 2023
Tokyo Electron Limited
Hirokazu Ueda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of forming boron-based film, and film forming apparatus
Patent number
11,145,522
Issue date
Oct 12, 2021
Tokyo Electron Limited
Yoshimasa Watanabe
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Film forming method, boron film, and film forming apparatus
Patent number
10,388,524
Issue date
Aug 20, 2019
Tokyo Electron Limited
Hirokazu Ueda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Doping method, doping apparatus and method of manufacturing semicon...
Patent number
9,472,404
Issue date
Oct 18, 2016
Tokyo Electron Limited
Hirokazu Ueda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma doping apparatus and plasma doping method
Patent number
9,029,249
Issue date
May 12, 2015
Tokyo Electron Limited
Hirokazu Ueda
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
Publication number
20230131213
Publication date
Apr 27, 2023
TOKYO ELECTRON LIMITED
Isao GUNJI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR FORMING BORON-BASED FILM, FORMATION APPARATUS
Publication number
20210090888
Publication date
Mar 25, 2021
TOKYO ELECTRON LIMITED
Hirokazu UEDA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
BORON-BASED FILM FORMING METHOD AND APPARATUS
Publication number
20190301019
Publication date
Oct 3, 2019
TOKYO ELECTRON LIMITED
Yoshimasa WATANABE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method of Forming Boron-Based Film, and Film Forming Apparatus
Publication number
20190244838
Publication date
Aug 8, 2019
TOKYO ELECTRON LIMITED
Yoshimasa WATANABE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
BORON FILM REMOVING METHOD, AND PATTERN FORMING METHOD AND APPARATU...
Publication number
20180350598
Publication date
Dec 6, 2018
TOKYO ELECTRON LIMITED
Yoshimasa WATANABE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Film Forming Method, Boron Film, and Film Forming Apparatus
Publication number
20180174838
Publication date
Jun 21, 2018
TOKYO ELECTRON LIMITED
Hirokazu UEDA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
DOPING METHOD, DOPING APPARATUS, AND SEMICONDUCTOR ELEMENT MANUFACT...
Publication number
20180012763
Publication date
Jan 11, 2018
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
Publication number
20160351398
Publication date
Dec 1, 2016
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DOPING METHOD AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
Publication number
20160189963
Publication date
Jun 30, 2016
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DOPING METHOD, DOPING APPARATUS AND METHOD OF MANUFACTURING SEMICON...
Publication number
20150187582
Publication date
Jul 2, 2015
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLA...
Publication number
20150132929
Publication date
May 14, 2015
TOKYO ELECTRON LIMITED
Masahiro Horigome
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA DOPING APPARATUS, PLASMA DOPING METHOD, SEMICONDUCTOR DEVICE...
Publication number
20140357068
Publication date
Dec 4, 2014
TOKYO ELECTRON LIMITED
Masahiro Horigome
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA DOPING APPARATUS AND PLASMA DOPING METHOD
Publication number
20140179028
Publication date
Jun 26, 2014
TOKYO ELECTRON LIMITED
Hirokazu UEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA DOPING APPARATUS, PLASMA DOPING METHOD, AND METHOD FOR MANUF...
Publication number
20140094024
Publication date
Apr 3, 2014
TOKYO ELECTRON LIMITED
Masahiro OKA
H01 - BASIC ELECTRIC ELEMENTS