Masahiro Sumiya

Person

Kudamatsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,765
- Issue date Nov 26, 2024
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for releasing sample
- Patent number 12,148,633
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,112,925
- Issue date Oct 8, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
State prediction apparatus and semiconductor manufacturing apparatus
- Patent number 12,050,455
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- G05 - CONTROLLING REGULATING
Information Patent Grant
Diagnosis apparatus, plasma processing apparatus and diagnosis method
- Patent number 12,040,167
- Issue date Jul 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota Umeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing method
- Patent number 11,742,214
- Issue date Aug 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Junya Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,664,233
- Issue date May 30, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 11,538,671
- Issue date Dec 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,424,108
- Issue date Aug 23, 2022
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,355,324
- Issue date Jun 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,792
- Issue date Apr 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,257,661
- Issue date Feb 22, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and prediction apparatus of the conditi...
- Patent number 11,107,664
- Issue date Aug 31, 2021
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 11,107,694
- Issue date Aug 31, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 10,886,110
- Issue date Jan 5, 2021
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and method for releasing sample
- Patent number 10,825,700
- Issue date Nov 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 10,510,519
- Issue date Dec 17, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 10,490,412
- Issue date Nov 26, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,395,935
- Issue date Aug 27, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,184,173
- Issue date Jan 22, 2019
- Hitachi High-Technologies Corporation
- Takahiro Yonemoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,960,031
- Issue date May 1, 2018
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,941,133
- Issue date Apr 10, 2018
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,496,147
- Issue date Nov 15, 2016
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,557,709
- Issue date Oct 15, 2013
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,236,701
- Issue date Aug 7, 2012
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,771,608
- Issue date Aug 10, 2010
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus having high frequency power source with...
- Patent number 7,615,132
- Issue date Nov 10, 2009
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method of insulating film
- Patent number 7,585,776
- Issue date Sep 8, 2009
- Hitachi High-Technologies Corporation
- Nobuyuki Negishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus using active matching
- Patent number 7,373,899
- Issue date May 20, 2008
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS DIAGNOSTIC APPARATUS, SEMICONDUCTOR MANUFACTURING APPARAT...
- Publication number 20240339308
- Publication date Oct 10, 2024
- Satoru Matsukura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...
- Publication number 20240321608
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Pushe ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSTIC APPARATUS AND DIAGNOSTIC METHOD, AND SEMICONDUCTOR MANUF...
- Publication number 20240310821
- Publication date Sep 19, 2024
- Hitachi High-Tech Corporation
- Masaaki YAMAMOTO
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS DIAGNOSTIC SYSTEM, APPARATUS DIAGNOSTIC APPARATUS, SEMICO...
- Publication number 20240310827
- Publication date Sep 19, 2024
- Hitachi High-Tech Corporation
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSIS DEVICE, DIAGNOSIS METHOD, PLASMA PROCESSING APPARATUS, AN...
- Publication number 20240213003
- Publication date Jun 27, 2024
- Hitachi High-Tech Corporation
- Shota UMEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER
- Publication number 20230207279
- Publication date Jun 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Kazuhiro UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230110096
- Publication date Apr 13, 2023
- Hitachi High-Tech Corporation
- Anil PANDEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS DIAGNOSTIC APPARATUS, APPARATUS DIAGNOSTIC METHOD, PLASMA...
- Publication number 20220399182
- Publication date Dec 15, 2022
- Hitachi High-Tech Corporation
- Shota Umeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20220375726
- Publication date Nov 24, 2022
- Kosa Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220359166
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220359172
- Publication date Nov 10, 2022
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20220262606
- Publication date Aug 18, 2022
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSIS APPARATUS, PLASMA PROCESSING APPARATUS AND DIAGNOSIS METHOD
- Publication number 20220157580
- Publication date May 19, 2022
- Hitachi High-Tech Corporation
- Shota Umeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220139678
- Publication date May 5, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20210358758
- Publication date Nov 18, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210358722
- Publication date Nov 18, 2021
- Hitachi High-Technologies Corporation
- Anil Pandey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PREDICTION METHOD OF THE CONDITION...
- Publication number 20210082673
- Publication date Mar 18, 2021
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR RELEASING SAMPLE
- Publication number 20210013060
- Publication date Jan 14, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200294777
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Kosa HIROTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STATE PREDICTION APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20200064820
- Publication date Feb 27, 2020
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS
- Publication number 20200066500
- Publication date Feb 27, 2020
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20200058511
- Publication date Feb 20, 2020
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190333772
- Publication date Oct 31, 2019
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER
- Publication number 20190326101
- Publication date Oct 24, 2019
- Hitachi High-Technologies Corporation
- Kazuhiro UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PREDICTION APPARATUS OF THE CONDITI...
- Publication number 20190237309
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Yoshito KAMAJI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PREDICTION METHOD OF THE CONDITION...
- Publication number 20190088455
- Publication date Mar 21, 2019
- Hitachi High-Technologies Corporation
- Yoshito KAMAJI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180190502
- Publication date Jul 5, 2018
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20180082855
- Publication date Mar 22, 2018
- Hitachi High-Technologies Corporation
- Junya SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR RELEASING SAMPLE
- Publication number 20180040491
- Publication date Feb 8, 2018
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20170194157
- Publication date Jul 6, 2017
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS

Masahiro Sumiya

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method for releasing sample

Plasma processing apparatus

Plasma processing apparatus and prediction method of the condition...

State prediction apparatus and semiconductor manufacturing apparatus

Diagnosis apparatus, plasma processing apparatus and diagnosis method

Plasma processing method

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and data analysis apparatus

Plasma processing apparatus

Plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and prediction apparatus of the conditi...

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and prediction method of the condition...

Plasma processing apparatus and method for releasing sample

Plasma processing apparatus and data analysis apparatus

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and plasma processing method

Plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method and apparatus

Plasma processing apparatus having high frequency power source with...

Dry etching method of insulating film

Plasma processing apparatus using active matching

Patents Applicationslast 30 patents

APPARATUS DIAGNOSTIC APPARATUS, SEMICONDUCTOR MANUFACTURING APPARAT...

DIAGNOSTIC DEVICE, SEMICONDUCTOR MANUFACTURING EQUIPMENT SYSTEM, SE...

DIAGNOSTIC APPARATUS AND DIAGNOSTIC METHOD, AND SEMICONDUCTOR MANUF...

APPARATUS DIAGNOSTIC SYSTEM, APPARATUS DIAGNOSTIC APPARATUS, SEMICO...

DIAGNOSIS DEVICE, DIAGNOSIS METHOD, PLASMA PROCESSING APPARATUS, AN...

PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER

PLASMA PROCESSING APPARATUS

APPARATUS DIAGNOSTIC APPARATUS, APPARATUS DIAGNOSTIC METHOD, PLASMA...

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

DIAGNOSIS APPARATUS, PLASMA PROCESSING APPARATUS AND DIAGNOSIS METHOD

PLASMA PROCESSING APPARATUS

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PREDICTION METHOD OF THE CONDITION...

PLASMA PROCESSING APPARATUS AND METHOD FOR RELEASING SAMPLE

PLASMA PROCESSING METHOD

STATE PREDICTION APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND MEMBER OF PLASMA PROCESSING CHAMBER

PLASMA PROCESSING APPARATUS AND PREDICTION APPARATUS OF THE CONDITI...

PLASMA PROCESSING APPARATUS AND PREDICTION METHOD OF THE CONDITION...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD FOR RELEASING SAMPLE

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME