Masahiro YOSHIDOME

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist pattern forming method and semiconductor chip manufacturing...
- Patent number 12,210,287
- Issue date Jan 28, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical liquid storage body
- Patent number 11,976,001
- Issue date May 7, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical liquid purification method and chemical liquid
- Patent number 11,958,005
- Issue date Apr 16, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Chemical liquid purification method and chemical liquid
- Patent number 11,491,428
- Issue date Nov 8, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Chemical liquid purification method
- Patent number 11,351,503
- Issue date Jun 7, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Actinic ray- or radiation-sensitive resin composition, actinic ray-...
- Patent number 9,454,079
- Issue date Sep 27, 2016
- FUJIFILM Corporation
- Akinori Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,802,349
- Issue date Aug 12, 2014
- FUJIFILM Corporation
- Masahiro Yoshidome
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Surface-treating agent for pattern formation and pattern-forming me...
- Patent number 8,431,330
- Issue date Apr 30, 2013
- FUJIFILM Corporation
- Wataru Hoshino
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Surface-treating agent for pattern formation and pattern-forming me...
- Patent number 8,088,566
- Issue date Jan 3, 2012
- FUJIFILM Corporation
- Wataru Hoshino
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL SOLUTION
- Publication number 20250028249
- Publication date Jan 23, 2025
- FUJIFILM CORPORATION
- Akihiko OHTSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL LIQUID STORAGE BODY
- Publication number 20240246853
- Publication date Jul 25, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID
- Publication number 20240216843
- Publication date Jul 4, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
DEFECT REMOVAL DEVICE, DEFECT REMOVAL METHOD, PATTERN FORMING METHO...
- Publication number 20230395366
- Publication date Dec 7, 2023
- FUJIFILM CORPORATION
- Akihiko OHTSU
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS APPARATUS AND ANALYSIS METHOD
- Publication number 20230369086
- Publication date Nov 16, 2023
- FUJIFILM CORPORATION
- Akihiko OHTSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF WASHING SEM...
- Publication number 20230243780
- Publication date Aug 3, 2023
- FUJIFILM CORPORATION
- Akihiko OHTSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL LIQUID SUPPLY METHOD AND PATTERN FORMING METHOD
- Publication number 20230229078
- Publication date Jul 20, 2023
- FUJIFILM CORPORATION
- Masahiro YOSHIDOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INSPECTING CHEMICAL SOLUTION, METHOD FOR PRODUCING CHEMI...
- Publication number 20230097195
- Publication date Mar 30, 2023
- FUJIFILM CORPORATION
- Akihiko OHTSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID
- Publication number 20230087746
- Publication date Mar 23, 2023
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...
- Publication number 20210405535
- Publication date Dec 30, 2021
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL LIQUID STORAGE BODY
- Publication number 20200181008
- Publication date Jun 11, 2020
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
CHEMICAL LIQUID PURIFICATION METHOD
- Publication number 20200171434
- Publication date Jun 4, 2020
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID
- Publication number 20200164294
- Publication date May 28, 2020
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...
- Publication number 20170059995
- Publication date Mar 2, 2017
- FUJIFILM CORPORATION
- Hajime FURUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20160054658
- Publication date Feb 25, 2016
- FUJIFILM CORPORATION
- Masahiro YOSHIDOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140248562
- Publication date Sep 4, 2014
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140234759
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Shohei KATAOKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140212814
- Publication date Jul 31, 2014
- FUJIFILM CORPORATION
- Junichi ITO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120171618
- Publication date Jul 5, 2012
- FUJIFILM CORPORATION
- Yusuke IIZUKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING ME...
- Publication number 20120076991
- Publication date Mar 29, 2012
- FUJIFILM CORPORATION
- Wataru HOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20120015301
- Publication date Jan 19, 2012
- FUJIFILM CORPORATION
- Masahiro Yoshidome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20110223536
- Publication date Sep 15, 2011
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING...
- Publication number 20100203445
- Publication date Aug 12, 2010
- FUJIFILM CORPORATION
- Wataru Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING ME...
- Publication number 20100183978
- Publication date Jul 22, 2010
- FUJIFILM CORPORATION
- Masahiro Yoshidome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING ME...
- Publication number 20080241742
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Wataru HOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masahiro YOSHIDOME

Person

Patents Grantslast 30 patents

Resist pattern forming method and semiconductor chip manufacturing...

Chemical liquid storage body

Chemical liquid purification method and chemical liquid

Chemical liquid purification method and chemical liquid

Chemical liquid purification method

Actinic ray- or radiation-sensitive resin composition, actinic ray-...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Surface-treating agent for pattern formation and pattern-forming me...

Surface-treating agent for pattern formation and pattern-forming me...

Patents Applicationslast 30 patents

CHEMICAL SOLUTION

CHEMICAL LIQUID STORAGE BODY

CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID

DEFECT REMOVAL DEVICE, DEFECT REMOVAL METHOD, PATTERN FORMING METHO...

ANALYSIS APPARATUS AND ANALYSIS METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF WASHING SEM...

CHEMICAL LIQUID SUPPLY METHOD AND PATTERN FORMING METHOD

METHOD FOR INSPECTING CHEMICAL SOLUTION, METHOD FOR PRODUCING CHEMI...

CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID

RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR CHIP MANUFACTURING...

CHEMICAL LIQUID STORAGE BODY

CHEMICAL LIQUID PURIFICATION METHOD

CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING ME...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING...

SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING ME...

SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING ME...