Masahisa WATANABE

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and stage
- Patent number 11,915,964
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Yuichiro Wagatsuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing phosphorus-doped silicon film and system therefor
- Patent number 11,749,530
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Yoshihiro Takezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate delivery method
- Patent number 11,664,266
- Issue date May 30, 2023
- Tokyo Electron Limited
- Yuichiro Wagatsuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sealing structure, vacuum processing apparatus and sealing method
- Patent number 11,476,132
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Hachishiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus, film forming method and heat insulating member
- Patent number 10,570,508
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Satoshi Takagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask structure forming method and film forming apparatus
- Patent number 9,852,907
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming mask structure
- Patent number 9,388,495
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing metal impurity from quartz component part used...
- Patent number 8,834,817
- Issue date Sep 16, 2014
- Tokyo Electron Limited
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Trench-filling method and film-forming system
- Patent number 8,722,510
- Issue date May 13, 2014
- Tokyo Electron Limited
- Masahisa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench filling method and method of manufacturing semiconductor int...
- Patent number 8,685,832
- Issue date Apr 1, 2014
- Tokyo Electron Limited
- Masahisa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench embedding method
- Patent number 8,455,369
- Issue date Jun 4, 2013
- Tokyo Electron Limited
- Masahisa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing polysilazane film
- Patent number 8,122,850
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing polysilazane film
- Patent number 7,879,397
- Issue date Feb 1, 2011
- Tokyo Electron Limited
- Masahisa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing polysilazane film
- Patent number 7,563,481
- Issue date Jul 21, 2009
- Tokyo Electron Limited
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240128081
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
- Publication number 20230392261
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Yuichiro WAGATSUMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20230094053
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Yuichiro WAGATSUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REMOVING PHOSPHORUS-DOPED SILICON FILM AND SYSTEM THEREFOR
- Publication number 20210398817
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND STAGE
- Publication number 20210193503
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Yuichiro WAGATSUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE DELIVERY METHOD
- Publication number 20210005505
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Yuichiro WAGATSUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING STRUCTURE, VACUUM PROCESSING APPARATUS AND SEALING METHOD
- Publication number 20210005482
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE, SUBSTRATE PROCESSING APPARATUS AND STAGE ASSEMBLING METHOD
- Publication number 20210005502
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Yuichiro WAGATSUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20190309420
- Publication date Oct 10, 2019
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning Method and Operating Method of Film-Forming Apparatus, and...
- Publication number 20190284687
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Tatsuya MIYAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING METHOD AND HEAT INSULATING MEMBER
- Publication number 20180179625
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Satoshi TAKAGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK STRUCTURE FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20170263455
- Publication date Sep 14, 2017
- TOKYO ELECTRON LIMITED
- Masahisa WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Forming Mask Structure, Film Forming Apparatus and Non-Tr...
- Publication number 20150125606
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Masahisa WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRENCH FILLING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR INT...
- Publication number 20130052795
- Publication date Feb 28, 2013
- TOKYO ELECTRON LIMITED
- Masahisa WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH EMBEDDING METHOD AND FILM-FORMING APPARATUS
- Publication number 20120164842
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Masahisa WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH-FILLING METHOD AND FILM-FORMING SYSTEM
- Publication number 20120028437
- Publication date Feb 2, 2012
- TOKYO ELECTRON LIMITED
- Masahisa WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for removing metal impurity from quartz component part used...
- Publication number 20100135877
- Publication date Jun 3, 2010
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING POLYSILAZANE FILM
- Publication number 20090263292
- Publication date Oct 22, 2009
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for removing metal impurity from quartz component part used...
- Publication number 20090041650
- Publication date Feb 12, 2009
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for processing polysilazane film
- Publication number 20080139001
- Publication date Jun 12, 2008
- Masahisa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing polysilazane film
- Publication number 20070231484
- Publication date Oct 4, 2007
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS

Masahisa WATANABE

Person

Patents Grantslast 30 patents

Substrate processing apparatus and stage

Method of removing phosphorus-doped silicon film and system therefor

Substrate processing apparatus and substrate delivery method

Sealing structure, vacuum processing apparatus and sealing method

Film forming apparatus, film forming method and heat insulating member

Mask structure forming method and film forming apparatus

Method of forming mask structure

Method for removing metal impurity from quartz component part used...

Trench-filling method and film-forming system

Trench filling method and method of manufacturing semiconductor int...

Trench embedding method

Method and apparatus for processing polysilazane film

Method for processing polysilazane film

Method and apparatus for processing polysilazane film

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD OF REMOVING PHOSPHORUS-DOPED SILICON FILM AND SYSTEM THEREFOR

SUBSTRATE PROCESSING APPARATUS AND STAGE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE DELIVERY METHOD

SEALING STRUCTURE, VACUUM PROCESSING APPARATUS AND SEALING METHOD

STAGE, SUBSTRATE PROCESSING APPARATUS AND STAGE ASSEMBLING METHOD

Substrate Processing Apparatus and Substrate Processing Method

Cleaning Method and Operating Method of Film-Forming Apparatus, and...

FILM FORMING APPARATUS, FILM FORMING METHOD AND HEAT INSULATING MEMBER

MASK STRUCTURE FORMING METHOD AND FILM FORMING APPARATUS

Method of Forming Mask Structure, Film Forming Apparatus and Non-Tr...

TRENCH FILLING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR INT...

TRENCH EMBEDDING METHOD AND FILM-FORMING APPARATUS

TRENCH-FILLING METHOD AND FILM-FORMING SYSTEM

Method for removing metal impurity from quartz component part used...

METHOD AND APPARATUS FOR PROCESSING POLYSILAZANE FILM

Method for removing metal impurity from quartz component part used...

Method for processing polysilazane film

Method and apparatus for processing polysilazane film